Ultrafast laser-enabled optoacoustic characterization of three-dimensional, nanoscopic interior features of microchips

IF 3.8 2区 物理与天体物理 Q1 ACOUSTICS
Yi He , Guojie Luo , Jie Huang , Yehai Li , Hoon Sohn , Zhongqing Su
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引用次数: 0

Abstract

The recent advances in micromanufacturing have been pushing boundaries of the new generation of semiconductor devices, which, in the meantime, brings new challenges in the material and structural characterization – a key step to ensure the device quality through the micromanufacturing process. An ultrafast laser-enable optoacoustic characterization methodology is developed, targeting in situ calibration and delineation of the three-dimensional (3-D), nanoscopic interior features of opaque semiconductor chips. With the guidance of ultrafast electron–phonon coupling effect and velocity-perturbated optical interference, a femtosecond-laser pump–probe set-up based on Sagnac interferometer is configured to generate and acquire picosecond ultrasonic bulk waves (P-UBWs) traversing the microchips. The interior features of the microchips shift the phase of acquired P-UBW signals, reflected in the perturbed probe laser beam. The phase shifts are calibrated to compute signal correlation of P-UBW signals between different acquiring positions, whereby to delineate the interior features in an intuitive manner. The approach is experimentally validated by characterizing nanoscopic, invisible interior aurum(Au)-gratings with periodically varied depths in typical microchips. Results highlight that the 3-D nanoscopic features of the microchips can be revealed with a microscopic and a nanoscopic spatial resolution, respectively along the transverse and depth directions of the chip, where the Au-gratings become “visible” with a depth variance of a few tens of nanometers only. This proposed approach has provided a fast, nondestructive approach to “see” through an opaque microchip with a nanoscopic resolution.
利用超快激光对微型芯片的三维纳米内部特征进行光声表征。
微制造技术的最新进展推动了新一代半导体器件的发展,同时也给材料和结构表征带来了新的挑战,而材料和结构表征是通过微制造过程确保器件质量的关键步骤。针对不透明半导体芯片的三维(3-D)、纳米级内部特征的现场校准和划分,我们开发了一种超快激光光声表征方法。在超快电子-声子耦合效应和速度扰动光学干涉的指导下,基于萨格纳克干涉仪的飞秒激光泵浦-探针装置被配置用来产生和获取穿越微芯片的皮秒超声波(P-UBW)。微芯片的内部特征会移动所获取的 P-UBW 信号的相位,并反射到扰动探针激光束中。对相移进行校准,计算不同采集位置之间 P-UBW 信号的相关性,从而以直观的方式划分内部特征。通过对典型微芯片中深度周期性变化的纳米级不可见内部金(Au)光栅进行表征,对该方法进行了实验验证。结果表明,微芯片的三维纳米特征可以在芯片的横向和纵向分别以微米级和纳米级的空间分辨率显示出来,其中金槽的 "可见 "深度差异仅为几十纳米。这种拟议的方法提供了一种快速、无损的方法,能以纳米分辨率 "看透 "不透明的微芯片。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Ultrasonics
Ultrasonics 医学-核医学
CiteScore
7.60
自引率
19.00%
发文量
186
审稿时长
3.9 months
期刊介绍: Ultrasonics is the only internationally established journal which covers the entire field of ultrasound research and technology and all its many applications. Ultrasonics contains a variety of sections to keep readers fully informed and up-to-date on the whole spectrum of research and development throughout the world. Ultrasonics publishes papers of exceptional quality and of relevance to both academia and industry. Manuscripts in which ultrasonics is a central issue and not simply an incidental tool or minor issue, are welcomed. As well as top quality original research papers and review articles by world renowned experts, Ultrasonics also regularly features short communications, a calendar of forthcoming events and special issues dedicated to topical subjects.
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