Photoluminescence probing of light absorption centers at silica laser damage.

IF 3.2 2区 物理与天体物理 Q2 OPTICS
Optics express Pub Date : 2024-07-15 DOI:10.1364/OE.527241
Yoonsoo Rho, Matthias A Daeumer, Christopher F Miller, Christopher M Mah, Ted A Laurence, Christopher W Carr, Jae Hyuck Yoo
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引用次数: 0

Abstract

We use photoluminescence (PL) imaging to study damage growth precursors within laser damage sites on the surface of silica. Damage site evolution is induced by multiple shots of UV nanosecond pulsed laser at various energy densities and monitored throughout the early stages of growth. Wide-field PL imaging rapidly locates microscopic light absorption centers within the silica damage site. Our quantitative analysis shows that damage sites with strong local PL intensity show a higher probability of growth upon subsequent laser pulses. Scanning electron microscopy (SEM) paired with a study of PL spectrum shows that the strong PL intensity appears from the subsurface fractures with high defect density, which provides a local light absorption center leading to significant damage growth. We believe that this result offers an efficient optical damage mitigation strategy by providing a rapid and non-destructive optical inspection approach.

二氧化硅激光损伤处光吸收中心的光致发光探测。
我们使用光致发光(PL)成像技术来研究二氧化硅表面激光损伤点内的损伤生长前体。损伤点的演变是由不同能量密度的紫外纳秒脉冲激光的多次发射诱导的,并在整个生长的早期阶段进行监测。宽视场聚光成像可快速定位二氧化硅损伤点内的微观光吸收中心。我们的定量分析显示,具有较强局部聚光强度的损伤点在随后的激光脉冲下显示出更高的生长概率。扫描电子显微镜(SEM)和聚光光谱研究表明,强聚光强度出现在具有高缺陷密度的次表层裂缝中,它提供了一个局部光吸收中心,从而导致显著的损伤生长。我们相信,这一结果提供了一种快速、无损的光学检测方法,从而提供了一种有效的光学损伤缓解策略。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Optics express
Optics express 物理-光学
CiteScore
6.60
自引率
15.80%
发文量
5182
审稿时长
2.1 months
期刊介绍: Optics Express is the all-electronic, open access journal for optics providing rapid publication for peer-reviewed articles that emphasize scientific and technology innovations in all aspects of optics and photonics.
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