Nebular dust attenuation with the Balmer and Paschen lines based on the MaNGA survey

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Zesen Lin, Renbin Yan
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引用次数: 0

Abstract

Dust attenuations observed by stars and ionized gas are not necessarily the same. The lack of observational constraints on the nebular dust attenuation curve leaves a large uncertainty when correcting nebular dust attenuation with stellar continuum-based attenuation curves. Making use of the DAP catalogs of the MaNGA survey, we investigate the nebular dust attenuation of H II regions traced by the Balmer and Paschen lines. Based on a simple simulation, we find that star-forming regions on kpc scales favor the classic foreground screen dust model rather than the uniform mixture model. We propose a novel approach to fit the dust attenuation curve using the emission-line fluxes directly. For strong hydrogen recombination lines (e.g., Hγ, Hδ, and Hϵ), the slopes of the nebular attenuation curve can be well determined and are found to be in good agreement with the Fitzpatrick Milky Way extinction curve with an accuracy of ≲4% in terms of the correction factor. However, severe contaminations and/or systematic uncertainties prevent us from obtaining reasonable values of the slopes for weak recombination lines (e.g., the high-order Balmer lines or the Paschen lines). We discuss how the choice of emission line measurement methods affects the results. Our results demonstrate the difficulty of deriving an average nebular dust attenuation curve given the current ground-based emission-line measurements.
基于 MaNGA 勘测的巴尔默线和帕申线的星云尘埃衰减
恒星和电离气体观测到的尘埃衰减不一定相同。由于缺乏对星云尘埃衰减曲线的观测约束,因此在用基于恒星连续谱的衰减曲线校正星云尘埃衰减时存在很大的不确定性。利用MaNGA巡天的DAP星表,我们研究了由Balmer和Paschen线追踪的H II区域的星云尘埃衰减。基于简单的模拟,我们发现 kpc 尺度上的恒星形成区更倾向于经典的前景屏幕尘埃模型,而不是均匀混合模型。我们提出了一种直接利用发射线通量拟合尘埃衰减曲线的新方法。对于强氢重组线(如 Hγ、Hδ 和 Hϵ),可以很好地确定星云衰减曲线的斜率,并发现它与 Fitzpatrick 银河消光曲线非常吻合,校正因子的精度为 ≲4%。然而,严重的污染和/或系统不确定性使我们无法获得弱重组线(如高阶巴尔默线或帕申线)斜率的合理值。我们讨论了发射线测量方法的选择对结果的影响。我们的结果表明,根据目前的地基发射线测量方法,很难推导出平均的星云尘埃衰减曲线。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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