All-in Situ Molecular-Templated Atomic Layer Deposition for Volatile Organic Compound Sensors

IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Hideaki Matsuo, Takuro Hosomi*, Jiangyang Liu, Hikaru Saito, Wataru Tanaka, Tsunaki Takahashi and Takeshi Yanagida*, 
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Abstract

Molecular-templated atomic layer deposition (ALD) is defined as a deposition process in the presence of target molecules on surfaces. The resulting nanocavities after removal of the template molecules have unique molecular recognition abilities and are promising for various applications, including volatile organic compound sensors. However, few studies have investigated the nanocavity formation process, mainly due to its complexity. In particular, the complicated reconstructions of metal oxide surfaces in solution-phase processes have hindered facile control of the molecular template formation process. Here, we developed a molecular-templated ALD system performed entirely in the gas phase. The key to this system is a QCM chip covered by a metal oxide (ZnO) nanowire array, which amplifies the QCM signals to enable minute amounts of molecular monitoring. The suppression of metal oxide (TiO2) deposition in the ALD low cycle region (less than 20 cycles) was confirmed by QCM, indicating that the molecule significantly affects the formation of metal oxide nanosurfaces. The effect of the template molecule on the nanosurface formation in this region was also suggested by scanning transmission electron microscopy (STEM) and electron energy loss spectroscopy (EELS). Furthermore, the molecular capture ability after removing the template molecule was investigated by exposure to hexanal vapor. The amount of molecular adsorption was dependent on the ALD cycle number, with the highest value obtained near the cycle number, where the template molecule influenced the ALD growth mode. These results suggest that TiO2 grew around the template molecule to form a nanostructure influenced by the presence of the molecule, enhancing its ability to capture molecules of similar size as the template molecules. The technology developed in this study is expected to pave the way for the development of molecular sensors that can selectively adsorb and detect specific substances in gas mixtures.

Abstract Image

用于挥发性有机化合物传感器的原位分子-模板原子层沉积技术
分子模板原子层沉积(ALD)是指在表面存在目标分子的情况下进行的沉积过程。去除模板分子后形成的纳米空腔具有独特的分子识别能力,有望用于各种应用,包括挥发性有机化合物传感器。然而,很少有研究对纳米空腔的形成过程进行调查,这主要是由于其复杂性。尤其是溶液相过程中金属氧化物表面的复杂重构阻碍了分子模板形成过程的便捷控制。在这里,我们开发了一种完全在气相中进行的分子模板 ALD 系统。该系统的关键是由金属氧化物 (ZnO) 纳米线阵列覆盖的 QCM 芯片,它可以放大 QCM 信号,从而实现微量分子监测。 QCM 证实,在 ALD 低周期区域(少于 20 个周期),金属氧化物 (TiO2) 沉积受到抑制,这表明分子对金属氧化物纳米表面的形成有显著影响。扫描透射电子显微镜(STEM)和电子能量损失光谱(EELS)也表明了模板分子对该区域纳米表面形成的影响。此外,还通过暴露于己醛蒸气中研究了去除模板分子后的分子捕获能力。分子吸附量与 ALD 周期数有关,在周期数附近获得的吸附量最高,模板分子影响了 ALD 生长模式。这些结果表明,TiO2 在模板分子周围生长,形成了受分子存在影响的纳米结构,增强了其捕获与模板分子大小相似的分子的能力。这项研究开发的技术有望为开发分子传感器铺平道路,这种传感器可以选择性地吸附和检测气体混合物中的特定物质。
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来源期刊
CiteScore
8.30
自引率
3.40%
发文量
1601
期刊介绍: ACS Applied Nano Materials is an interdisciplinary journal publishing original research covering all aspects of engineering, chemistry, physics and biology relevant to applications of nanomaterials. The journal is devoted to reports of new and original experimental and theoretical research of an applied nature that integrate knowledge in the areas of materials, engineering, physics, bioscience, and chemistry into important applications of nanomaterials.
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