Deep Ultraviolet Excitation Photoluminescence Characteristics and Correlative Investigation of Al-Rich AlGaN Films on Sapphire.

IF 4.4 3区 材料科学 Q2 CHEMISTRY, MULTIDISCIPLINARY
Nanomaterials Pub Date : 2024-11-04 DOI:10.3390/nano14211769
Zhe Chuan Feng, Ming Tian, Xiong Zhang, Manika Tun Nafisa, Yao Liu, Jeffrey Yiin, Benjamin Klein, Ian Ferguson
{"title":"Deep Ultraviolet Excitation Photoluminescence Characteristics and Correlative Investigation of Al-Rich AlGaN Films on Sapphire.","authors":"Zhe Chuan Feng, Ming Tian, Xiong Zhang, Manika Tun Nafisa, Yao Liu, Jeffrey Yiin, Benjamin Klein, Ian Ferguson","doi":"10.3390/nano14211769","DOIUrl":null,"url":null,"abstract":"<p><p>AlGaN is attractive for fabricating deep ultraviolet (DUV) optoelectronic and electronic devices of light-emitting diodes (LEDs), photodetectors, high-electron-mobility field-effect transistors (HEMTs), etc. We investigated the quality and optical properties of Al<sub>x</sub>Ga<sub>1-x</sub>N films with high Al fractions (60-87%) grown on sapphire substrates, including AlN nucleation and buffer layers, by metal-organic chemical vapor deposition (MOCVD). They were initially investigated by high-resolution X-ray diffraction (HR-XRD) and Raman scattering (RS). A set of formulas was deduced to precisely determine x(Al) from HR-XRD data. Screw dislocation densities in AlGaN and AlN layers were deduced. DUV (266 nm) excitation RS clearly exhibits AlGaN Raman features far superior to visible RS. The simulation on the AlGaN longitudinal optical (LO) phonon modes determined the carrier concentrations in the AlGaN layers. The spatial correlation model (SCM) analyses on E<sub>2</sub>(high) modes examined the AlGaN and AlN layer properties. These high-x(Al) Al<sub>x</sub>Ga<sub>1-x</sub>N films possess large energy gaps E<sub>g</sub> in the range of 5.0-5.6 eV and are excited by a DUV 213 nm (5.8 eV) laser for room temperature (RT) photoluminescence (PL) and temperature-dependent photoluminescence (TDPL) studies. The obtained RTPL bands were deconvoluted with two Gaussian bands, indicating cross-bandgap emission, phonon replicas, and variation with x(Al). TDPL spectra at 20-300 K of Al<sub>0.87</sub>Ga<sub>0.13</sub>N exhibit the T-dependences of the band-edge luminescence near 5.6 eV and the phonon replicas. According to the Arrhenius fitting diagram of the TDPL spectra, the activation energy (19.6 meV) associated with the luminescence process is acquired. In addition, the combined PL and time-resolved photoluminescence (TRPL) spectroscopic system with DUV 213 nm pulse excitation was applied to measure a typical AlGaN multiple-quantum well (MQW). The RT TRPL decay spectra were obtained at four wavelengths and fitted by two exponentials with fast and slow decay times of ~0.2 ns and 1-2 ns, respectively. Comprehensive studies on these Al-rich AlGaN epi-films and a typical AlGaN MQW are achieved with unique and significant results, which are useful to researchers in the field.</p>","PeriodicalId":18966,"journal":{"name":"Nanomaterials","volume":"14 21","pages":""},"PeriodicalIF":4.4000,"publicationDate":"2024-11-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC11547956/pdf/","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nanomaterials","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.3390/nano14211769","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

Abstract

AlGaN is attractive for fabricating deep ultraviolet (DUV) optoelectronic and electronic devices of light-emitting diodes (LEDs), photodetectors, high-electron-mobility field-effect transistors (HEMTs), etc. We investigated the quality and optical properties of AlxGa1-xN films with high Al fractions (60-87%) grown on sapphire substrates, including AlN nucleation and buffer layers, by metal-organic chemical vapor deposition (MOCVD). They were initially investigated by high-resolution X-ray diffraction (HR-XRD) and Raman scattering (RS). A set of formulas was deduced to precisely determine x(Al) from HR-XRD data. Screw dislocation densities in AlGaN and AlN layers were deduced. DUV (266 nm) excitation RS clearly exhibits AlGaN Raman features far superior to visible RS. The simulation on the AlGaN longitudinal optical (LO) phonon modes determined the carrier concentrations in the AlGaN layers. The spatial correlation model (SCM) analyses on E2(high) modes examined the AlGaN and AlN layer properties. These high-x(Al) AlxGa1-xN films possess large energy gaps Eg in the range of 5.0-5.6 eV and are excited by a DUV 213 nm (5.8 eV) laser for room temperature (RT) photoluminescence (PL) and temperature-dependent photoluminescence (TDPL) studies. The obtained RTPL bands were deconvoluted with two Gaussian bands, indicating cross-bandgap emission, phonon replicas, and variation with x(Al). TDPL spectra at 20-300 K of Al0.87Ga0.13N exhibit the T-dependences of the band-edge luminescence near 5.6 eV and the phonon replicas. According to the Arrhenius fitting diagram of the TDPL spectra, the activation energy (19.6 meV) associated with the luminescence process is acquired. In addition, the combined PL and time-resolved photoluminescence (TRPL) spectroscopic system with DUV 213 nm pulse excitation was applied to measure a typical AlGaN multiple-quantum well (MQW). The RT TRPL decay spectra were obtained at four wavelengths and fitted by two exponentials with fast and slow decay times of ~0.2 ns and 1-2 ns, respectively. Comprehensive studies on these Al-rich AlGaN epi-films and a typical AlGaN MQW are achieved with unique and significant results, which are useful to researchers in the field.

蓝宝石上富铝氮化铝薄膜的深紫外激发光致发光特性及相关研究。
氮化铝(AlGaN)对于制造发光二极管(LED)、光电探测器、高电子迁移率场效应晶体管(HEMT)等深紫外(DUV)光电和电子器件具有吸引力。我们研究了通过金属有机化学气相沉积(MOCVD)在蓝宝石基底上生长的高铝含量(60-87%)AlxGa1-xN 薄膜的质量和光学特性,包括 AlN 成核层和缓冲层。最初采用高分辨率 X 射线衍射 (HR-XRD) 和拉曼散射 (RS) 对其进行了研究。根据 HR-XRD 数据推导出了一套精确测定 x(Al)的公式。还推导出了 AlGaN 和 AlN 层中的螺旋位错密度。DUV(266 nm)激发的 RS 清晰地显示出 AlGaN 拉曼特征,远远优于可见光 RS。对 AlGaN 纵向光学 (LO) 声子模式的模拟确定了 AlGaN 层中的载流子浓度。对 E2(高)模式的空间关联模型(SCM)分析检验了氮化铝和氮化铝层的特性。这些高x(Al) AlxGa1-xN 薄膜具有 5.0-5.6 eV 范围内的大能隙 Eg,并由 DUV 213 nm (5.8 eV) 激光激发进行室温 (RT) 光致发光 (PL) 和温度相关光致发光 (TDPL) 研究。获得的 RTPL 带用两个高斯带进行了去卷积,表明了交叉带隙发射、声子复制以及随 x(Al)的变化。Al0.87Ga0.13N 在 20-300 K 时的 TDPL 光谱显示了 5.6 eV 附近带边发光和声子复制品的 T 依赖性。根据 TDPL 光谱的阿伦尼斯拟合图,获得了与发光过程相关的活化能(19.6 meV)。此外,利用 DUV 213 nm 脉冲激发的组合 PL 和时间分辨光致发光 (TRPL) 光谱系统测量了典型的 AlGaN 多量子阱 (MQW)。在四个波长下获得了 RT TRPL 衰减光谱,并用两个指数拟合,其快速和慢速衰减时间分别为 ~0.2 ns 和 1-2 ns。对这些富铝 AlGaN 磊晶片和典型 AlGaN MQW 的全面研究取得了独特而重要的成果,对该领域的研究人员很有帮助。
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来源期刊
Nanomaterials
Nanomaterials NANOSCIENCE & NANOTECHNOLOGY-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
8.50
自引率
9.40%
发文量
3841
审稿时长
14.22 days
期刊介绍: Nanomaterials (ISSN 2076-4991) is an international and interdisciplinary scholarly open access journal. It publishes reviews, regular research papers, communications, and short notes that are relevant to any field of study that involves nanomaterials, with respect to their science and application. Thus, theoretical and experimental articles will be accepted, along with articles that deal with the synthesis and use of nanomaterials. Articles that synthesize information from multiple fields, and which place discoveries within a broader context, will be preferred. There is no restriction on the length of the papers. Our aim is to encourage scientists to publish their experimental and theoretical research in as much detail as possible. Full experimental or methodical details, or both, must be provided for research articles. Computed data or files regarding the full details of the experimental procedure, if unable to be published in a normal way, can be deposited as supplementary material. Nanomaterials is dedicated to a high scientific standard. All manuscripts undergo a rigorous reviewing process and decisions are based on the recommendations of independent reviewers.
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