{"title":"Ultraviolet line structuring of large solar wafers","authors":"Henrike Schlutow, Ulrike Fuchs, Claudia Reinlein","doi":"10.1002/phvs.202400035","DOIUrl":null,"url":null,"abstract":"<p>Ultrashort-pulsed lasers are ideal for material processing by welding, marking, and cutting. Scanning systems are crucial for large substrates. We introduce a novel UV line structuring method using deformable mirror technology and freeform optics. This approach aims to improve processing times on large substrates, especially for M12 solar wafer processing. By using a freeform lens and a Zwobbel deformable mirror, we achieve extended processing fields and high scan frequencies. The paper explores optical designs, their robust optomechanical implementation for prototyping, and setup characterization.</p>","PeriodicalId":101021,"journal":{"name":"PhotonicsViews","volume":"21 5","pages":"57-61"},"PeriodicalIF":0.0000,"publicationDate":"2024-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/phvs.202400035","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"PhotonicsViews","FirstCategoryId":"1085","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/phvs.202400035","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Ultrashort-pulsed lasers are ideal for material processing by welding, marking, and cutting. Scanning systems are crucial for large substrates. We introduce a novel UV line structuring method using deformable mirror technology and freeform optics. This approach aims to improve processing times on large substrates, especially for M12 solar wafer processing. By using a freeform lens and a Zwobbel deformable mirror, we achieve extended processing fields and high scan frequencies. The paper explores optical designs, their robust optomechanical implementation for prototyping, and setup characterization.
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