Optimizing the resistivity of colloidal SnO2 thin films by ion implantation and annealing

IF 8.3 2区材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY

ACS Applied Materials & Interfaces Pub Date : 2024-10-28 DOI:10.1016/j.surfin.2024.105325

Abubakar Sadiq Yusuf , Martin Markwitz , Zhan Chen , Maziar Ramezani , John V. Kennedy , Holger Fiedler

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Abstract

Tin oxide (SnO₂) is a critical material for a wide range of applications, such as in perovskite solar cells, gas sensors, as well as for photocatalysis. For these applications the transparency to visible light, high availability, cheap fabrication process and high conductivity of SnO₂ benefits its commercial deployment. In this paper, we demonstrate that the resistivity of widely colloidal SnO₂ can be reduced by noble gas ion beam modification. After low energy argon implantation with a fluence of 4×10¹⁵ at.cm⁻² at 25keV and annealing at 200°C in air, the resistivity of as-deposited film was reduced from (178±6)μΩcm to (133±5)μΩcm, a reduction of 25%. Hall effect measurements showed that the primary cause of this is the increase in carrier concentration from (8.1±0.3)×10²⁰ cm⁻³ to (9.9±0.3)×10²⁰ cm⁻³. Annealing at 200°C resulted in the removal of defect clusters introduced by implantation, while annealing at 300°C resulted in the oxidation of the films, increasing their resistivity. The concentration of oxygen vacancy defects can be controlled by a combination of low energy noble gas ion implantation and annealing, providing promising performance increases for potential applications of SnO₂ where a low resistivity is crucial.

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通过离子注入和退火优化二氧化锡胶体薄膜的电阻率

氧化锡（SnO2）是一种应用广泛的关键材料，如用于过氧化物太阳能电池、气体传感器以及光催化。在这些应用中，二氧化锡对可见光的透明性、高可用性、廉价的制造工艺和高导电性都有利于其商业应用。在本文中，我们证明了通过惰性气体离子束改性可以降低广泛胶体二氧化锡的电阻率。在 25keV 下以 4×1015 at.cm-2 的通量进行低能氩离子注入并在 200°C 的空气中退火后，沉积薄膜的电阻率从 (178±6)μΩcm 降低到 (133±5)μΩcm，降低了 25%。霍尔效应测量结果表明，主要原因是载流子浓度从 (8.1±0.3)×1020 cm-3 增加到 (9.9±0.3)×1020 cm-3。200°C 退火可去除植入过程中引入的缺陷簇，而 300°C 退火则会导致薄膜氧化，增加其电阻率。氧空位缺陷的浓度可通过低能惰性气体离子植入和退火相结合的方法加以控制，从而有望提高对电阻率要求较低的二氧化锡的潜在应用性能。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

ACS Applied Materials & Interfaces 工程技术-材料科学：综合

CiteScore

16.00

自引率

6.30%

发文量

4978

审稿时长

1.8 months

期刊介绍： ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.