Growth and electronic structure of the nodal line semimetal in monolayer Cu2Si on Cu(111)

IF 2.1 4区化学 Q3 CHEMISTRY, PHYSICAL

Surface Science Pub Date : 2024-10-22 DOI:10.1016/j.susc.2024.122632

Jinfeng Xu , Chen Liu , Yuxuan Guo , Guikai Zhang , Kun Liu , Haijie Qian , Kaiqi Nie , Zhenyu Wang , Jiaou Wang

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引用次数: 0

Abstract

Cu₂Si, a single-layer two-dimensional material with a honeycomb structure, has been proposed to have Dirac nodal line fermions. In this study, the synchrotron radiation X-ray photoelectron spectroscopy, ultraviolet photoelectron spectroscopy, and angle-resolved photoemission spectroscopy (SR-XPS, SR-UPS, and SR-ARPES) techniques were used to investigate the dynamic process of in situ deposition of single-layer Cu₂Si on a Cu(111) crystal surface via molecular beam epitaxy (MBE). Cu₂Si existed as a monolayer (ML) alloy, and there were competing mechanisms of distinct chemical states of silicon in different growth periods, according to a detailed examination of the experimental SR-XPS and SR-UPS spectra. Additionally, a weak interaction between the Cu₂Si ML and Cu(111) was demonstrated via SR-ARPES and first-principles computations. The unique electronic structure of the Cu₂Si ML was not destroyed by either this weak interaction or the disordered silicon produced on the surface during the growth process. The study of the Cu₂Si growth kinetics provides a guarantee and a basis for the future exploration of the exotic properties of Cu₂Si.

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单层 Cu2Si 在 Cu(111) 上的生长和节点线半金属的电子结构

Cu2Si 是一种具有蜂巢结构的单层二维材料，被认为具有狄拉克结线费米子。本研究采用同步辐射 X 射线光电子能谱、紫外光电子能谱和角分辨光发射光谱（SR-XPS、SR-UPS 和 SR-ARPES）技术，研究了通过分子束外延（MBE）在铜（111）晶体表面原位沉积单层 Cu2Si 的动态过程。根据对 SR-XPS 和 SR-UPS 实验光谱的详细研究，Cu2Si 以单层 (ML) 合金的形式存在，并且在不同的生长时期存在硅的不同化学状态的竞争机制。此外，通过 SR-ARPES 和第一原理计算，证明了 Cu2Si ML 与 Cu(111) 之间存在微弱的相互作用。Cu2Si ML 的独特电子结构既没有被这种弱相互作用破坏，也没有被生长过程中表面产生的无序硅破坏。对 Cu2Si 生长动力学的研究为今后探索 Cu2Si 的奇异特性提供了保证和基础。

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来源期刊

Surface Science 化学-物理：凝聚态物理

CiteScore

3.30

自引率

5.30%

发文量

137

审稿时长

25 days

期刊介绍： Surface Science is devoted to elucidating the fundamental aspects of chemistry and physics occurring at a wide range of surfaces and interfaces and to disseminating this knowledge fast. The journal welcomes a broad spectrum of topics, including but not limited to: • model systems (e.g. in Ultra High Vacuum) under well-controlled reactive conditions • nanoscale science and engineering, including manipulation of matter at the atomic/molecular scale and assembly phenomena • reactivity of surfaces as related to various applied areas including heterogeneous catalysis, chemistry at electrified interfaces, and semiconductors functionalization • phenomena at interfaces relevant to energy storage and conversion, and fuels production and utilization • surface reactivity for environmental protection and pollution remediation • interactions at surfaces of soft matter, including polymers and biomaterials. Both experimental and theoretical work, including modeling, is within the scope of the journal. Work published in Surface Science reaches a wide readership, from chemistry and physics to biology and materials science and engineering, providing an excellent forum for cross-fertilization of ideas and broad dissemination of scientific discoveries.