Spin-Tunneling Magnetoresistive Effects in Bottom-Up-Grown Ni/Graphene/Ni Nanojunctions.

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
ACS Applied Materials & Interfaces Pub Date : 2024-11-13 Epub Date: 2024-10-31 DOI:10.1021/acsami.4c11199
Weicheng Qiu, Fuze Jiang, Junping Peng, Mengchun Pan, Peisen Li, Jiafei Hu, Yueguo Hu
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引用次数: 0

Abstract

Two-dimensional (2D) materials embedded in magnetic tunnel junctions (MTJs) provide a platform to increase the control over spin transport properties by the proximity spin-filtering effect. This could be harnessed to craft spintronic devices with low power consumption and high performance. We explore the spin transport in the 2D MTJs based on graphene, which is uniformly grown on Ni(111) substrates using the chemical vapor deposition technique. After the Ni thin film is deposited bottom-up on the well-grown Ni(111)/graphene surface in an e-beam evaporation system by the physical vapor deposition method, the Ni/graphene/Ni nanojunction array devices are successfully prepared by using nanography technology. Evidence of the emergence of tunneling magnetoresistance (TMR) effects with ultrasmall resistance × area products in graphene-based nanojunctions is observed by the exclusion of anisotropic magnetoresistance. The theoretical analysis shows that this TMR is mainly attributed to the strong spin-filtering effect at the perfect Ni(111)/graphene interface. Besides, earlier findings indicate that the TMR would be promoted more effectively if the short-circuit effect formed in the process of nanographic etching by an ion beam can be further eliminated. Overall, this study provides a path to harness the full potential of graphene-based MTJ array devices with a high efficiency and performance.

Abstract Image

自下而上生长的镍/石墨烯/镍纳米结中的自旋隧道磁阻效应
嵌入磁隧道结(MTJ)的二维(2D)材料提供了一个平台,可通过近距离自旋过滤效应提高对自旋传输特性的控制。这可以用来制造低功耗、高性能的自旋电子器件。我们探索了基于石墨烯的二维 MTJ 中的自旋传输,石墨烯是利用化学气相沉积技术均匀地生长在 Ni(111) 基底上的。在电子束蒸发系统中,利用物理气相沉积法将镍薄膜自下而上地沉积在生长良好的镍(111)/石墨烯表面后,利用纳米制图技术成功制备了镍/石墨烯/镍纳米结阵列器件。通过排除各向异性磁阻,观察到石墨烯基纳米结中出现了超小电阻 × 面积乘积的隧穿磁阻(TMR)效应。理论分析表明,这种 TMR 主要归因于完美的 Ni(111)/ 石墨烯界面上强烈的自旋过滤效应。此外,早先的研究结果表明,如果能进一步消除离子束纳米刻蚀过程中形成的短路效应,将能更有效地促进 TMR 的产生。总之,这项研究为充分利用石墨烯基 MTJ 阵列器件的高效率和高性能潜力提供了一条途径。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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