High-efficiency and easy-processing thin-film lithium niobate edge coupler

IF 3.5 2区物理与天体物理 Q2 PHYSICS, APPLIED

Applied Physics Letters Pub Date : 2024-10-29 DOI:10.1063/5.0233467

Di Jia, Qiang Luo, Chen Yang, Rui Ma, Xuanyi Yu, Feng Gao, Qifan Yang, Fang Bo, Guoquan Zhang, Jingjun Xu

引用次数: 0

Abstract

Fiber-to-chip coupling with ultralow loss and broadband operation wavelength range is essential in the practical applications of thin-film lithium niobate (TFLN) integrated photonic devices. However, the existing edge couplers often require electron beam lithography overlaying and multiple etching processes, which are expensive and complex. In this Letter, we demonstrate an edge coupler that includes only a vertically tapered TFLN waveguide and silicon dioxide cladding. The coupling efficiency between a lensed fiber and an on-chip LN waveguide is down to 1.43 dB/facet, while the 3-dB bandwidth exceeds the range from 1510 to 1630 nm. These edge couplers also show reliable fiber misalignment tolerance. Furthermore, the fabrication complexity is greatly reduced since only a single etching step for the TFLN waveguide is needed. The minimum waveguide width of 1.3 μm guarantees compatibility with i-line photolithography, providing a potential for massive production of TFLN devices.

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高效率、易加工的铌酸锂薄膜边缘耦合器

在铌酸锂薄膜（TFLN）集成光子器件的实际应用中，具有超低损耗和宽带工作波长范围的光纤到芯片耦合是必不可少的。然而，现有的边缘耦合器通常需要电子束光刻叠加和多重蚀刻工艺，成本昂贵且工艺复杂。在这封信中，我们展示了一种仅包括垂直锥形 TFLN 波导和二氧化硅包层的边缘耦合器。透镜光纤与片上 LN 波导之间的耦合效率低至 1.43 dB/facet，而 3-dB 带宽则超过了 1510 至 1630 nm 的范围。这些边缘耦合器还具有可靠的光纤错位容差。此外，由于 TFLN 波导只需一个蚀刻步骤，因此大大降低了制造复杂性。1.3 μm 的最小波导宽度保证了与 i 线光刻技术的兼容性，为 TFLN 器件的大规模生产提供了可能。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Applied Physics Letters 物理-物理：应用

CiteScore

6.40

自引率

10.00%

发文量

1821

审稿时长

1.6 months

期刊介绍： Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.