Scanning tunneling microscopy of ultrathin indium intercalated between graphene and SiC using confinement heteroepitaxy

IF 3.5 2区 物理与天体物理 Q2 PHYSICS, APPLIED
Van Dong Pham, César González, Yannick J. Dappe, Chengye Dong, Joshua A. Robinson, Achim Trampert, Roman Engel-Herbert
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Abstract

Large-scale and air-stable two-dimensional metal layers intercalated at the interface between epitaxial graphene and SiC offer an appealing material for quantum technology. The atomic and electronic details, as well as the control of the intercalated metals within the interface, however, remain very limited. In this Letter, we explored ultrathin indium confined between graphene and SiC using cryogenic scanning tunneling microscopy, complemented by first-principle density functional theory. Bias-dependent imaging and tunneling spectroscopy visualize a triangular superstructure with a periodicity of 14.7 ± 3 Å and an occupied state at about −1.6 eV, indicating proof of highly crystalline indium. The scanning tunneling microscopy tip was used to manipulate the number of indium layers below graphene, allowing to identify three monatomic In layers and to tune their corresponding electronic properties with atomic precision. This further allows us to attribute the observed triangular superstructure to be solely emerging from the In trilayer, tentatively explained by the lattice mismatch induced by lattice relaxation in the topmost In layer. Our findings provide a microscopic insight into the structure and electronic properties of intercalated metals within the graphene/SiC interface and a unique possibility to manipulate them with atomic precision using the scanning probe technique.
利用约束异质外延技术对石墨烯和碳化硅之间插层的超薄铟进行扫描隧道显微镜观察
在外延石墨烯和碳化硅之间的界面上插层的大规模、空气稳定的二维金属层为量子技术提供了一种极具吸引力的材料。然而,原子和电子细节以及界面内插层金属的控制仍然非常有限。在这封信中,我们利用低温扫描隧道显微镜,辅以第一原理密度泛函理论,探索了石墨烯和碳化硅之间的超薄铟。偏压成像和隧道光谱显示了一个三角形的上层结构,其周期为 14.7 ± 3 Å,占据态约为-1.6 eV,证明了铟的高度结晶性。我们使用扫描隧道显微镜尖端来操纵石墨烯下面的铟层数量,从而确定了三个单原子铟层,并以原子精度调整了它们相应的电子特性。这进一步使我们能够将观察到的三角形上层结构归因于铟三层,并初步解释为最顶层铟层的晶格弛豫引起的晶格失配。我们的研究结果从微观上揭示了石墨烯/碳化硅界面内插层金属的结构和电子特性,并为利用扫描探针技术以原子精度操纵它们提供了独特的可能性。
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来源期刊
Applied Physics Letters
Applied Physics Letters 物理-物理:应用
CiteScore
6.40
自引率
10.00%
发文量
1821
审稿时长
1.6 months
期刊介绍: Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.
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