Improving the photoswitching performance of a transistor with amorphous metal oxide semiconductor thin film by a gradient annealing approach

Abstract

Metal oxides are attracting attention as electronic mate rials in research and industry. Thin films of amorphous indium gallium zinc oxide (a-IGZO) exhibit low absorbance in the visible spectrum, making them ideal components in transparent electronics. To widen the scope of use for thin film transistor (TFT) devices based on a-IGZO in on-chip sensing applications, photoresponsive behavior has been achieved by proper engineering of the active layers by either introducing a photosensitive top layer or using a method to generate localized states inside the band gap. In this paper, we propose a bilayer structured with the use of thermal annealing of a-IGZO film at different temperatures. Thermal annealing has been shown to improve the electrical performance of the TFT devices because of the improved film quality but negatively affects the photoresponsivity by removing tarp sites that play an important role in both charge generation and photomultiplication via the photogating effect. Therefore, here we propose an a-IGZO film with a high temperature-annealed bottom layer and pristine top layer. The bottom layer plays a vital role in the charge transport behavior, resulting in a low threshold voltage and subthreshold swing similar to the device with a fully annealed film, while the photoresponse of the device is driven by the higher density of gap states in the pristine top layer. This proposed method is advantageous to previously published procedures due to the simplicity of using no additional materials and complex steps to introduce trap sites into the photoactive layer, but only differential annealing temperature.