Microstructure Evolution of the Interface in SiCf/TiC-Ti3SiC2 Composite under Sequential Xe-He-H Ion Irradiation and Annealing Process.

IF 4.4 3区 材料科学 Q2 CHEMISTRY, MULTIDISCIPLINARY
Nanomaterials Pub Date : 2024-10-11 DOI:10.3390/nano14201629
Penghui Lei, Qing Chang, Mingkun Xiao, Chao Ye, Pan Qi, Fangjie Shi, Yuhua Hang, Qianwu Li, Qing Peng
{"title":"Microstructure Evolution of the Interface in SiC<sub>f</sub>/TiC-Ti<sub>3</sub>SiC<sub>2</sub> Composite under Sequential Xe-He-H Ion Irradiation and Annealing Process.","authors":"Penghui Lei, Qing Chang, Mingkun Xiao, Chao Ye, Pan Qi, Fangjie Shi, Yuhua Hang, Qianwu Li, Qing Peng","doi":"10.3390/nano14201629","DOIUrl":null,"url":null,"abstract":"<p><p>A new type of SiC<sub>f</sub>/TiC-Ti<sub>3</sub>SiC<sub>2</sub> composite was prepared by the Spark Plasma Sintering (SPS) method in this work. The phase transformation and interface cracking of this composite under ion irradiation (single Xe, Xe + He, and Xe + He + H ions) and subsequent annealing were analyzed using transmission electron microscopy (TEM), mainly focusing on the interface regions. Xe ion irradiation resulted in the formation of high-density stacking faults in the TiC coatings and the complete amorphization of SiC fibers. The implanted H ions exacerbated interface coarsening. After annealing at 900 °C for 2 h, the interface in the Xe + He + H ion-irradiated samples was seriously damaged, resulting in the formation of large bubbles and cracks. This damage occurred because the H atoms reduced the surface free energy, thereby promoting the nucleation and growth of bubbles. Due to the absorption effect of the SiC<sub>f</sub>/TiC interface on defects, the SiC fiber areas near the interface recovered back to the initial nano-polycrystalline structure after annealing.</p>","PeriodicalId":18966,"journal":{"name":"Nanomaterials","volume":null,"pages":null},"PeriodicalIF":4.4000,"publicationDate":"2024-10-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC11510621/pdf/","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nanomaterials","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.3390/nano14201629","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

Abstract

A new type of SiCf/TiC-Ti3SiC2 composite was prepared by the Spark Plasma Sintering (SPS) method in this work. The phase transformation and interface cracking of this composite under ion irradiation (single Xe, Xe + He, and Xe + He + H ions) and subsequent annealing were analyzed using transmission electron microscopy (TEM), mainly focusing on the interface regions. Xe ion irradiation resulted in the formation of high-density stacking faults in the TiC coatings and the complete amorphization of SiC fibers. The implanted H ions exacerbated interface coarsening. After annealing at 900 °C for 2 h, the interface in the Xe + He + H ion-irradiated samples was seriously damaged, resulting in the formation of large bubbles and cracks. This damage occurred because the H atoms reduced the surface free energy, thereby promoting the nucleation and growth of bubbles. Due to the absorption effect of the SiCf/TiC interface on defects, the SiC fiber areas near the interface recovered back to the initial nano-polycrystalline structure after annealing.

Xe-He-H 离子连续辐照和退火过程中 SiCf/TiC-Ti3SiC2 复合材料界面的微观结构演变
本研究采用火花等离子烧结(SPS)方法制备了一种新型 SiCf/TiC-Ti3SiC2 复合材料。利用透射电子显微镜(TEM)分析了该复合材料在离子(单一 Xe、Xe + He 和 Xe + He + H 离子)辐照和随后的退火条件下的相变和界面裂纹,主要集中在界面区域。Xe 离子照射导致 TiC 涂层形成高密度堆叠断层,SiC 纤维完全非晶化。植入的 H 离子加剧了界面粗化。在 900 °C 下退火 2 小时后,Xe + He + H 离子辐照样品的界面受到严重破坏,形成了大气泡和裂纹。出现这种破坏的原因是 H 原子降低了表面自由能,从而促进了气泡的成核和生长。由于 SiCf/TiC 界面对缺陷的吸收效应,界面附近的 SiC 纤维区域在退火后恢复到了最初的纳米多晶结构。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Nanomaterials
Nanomaterials NANOSCIENCE & NANOTECHNOLOGY-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
8.50
自引率
9.40%
发文量
3841
审稿时长
14.22 days
期刊介绍: Nanomaterials (ISSN 2076-4991) is an international and interdisciplinary scholarly open access journal. It publishes reviews, regular research papers, communications, and short notes that are relevant to any field of study that involves nanomaterials, with respect to their science and application. Thus, theoretical and experimental articles will be accepted, along with articles that deal with the synthesis and use of nanomaterials. Articles that synthesize information from multiple fields, and which place discoveries within a broader context, will be preferred. There is no restriction on the length of the papers. Our aim is to encourage scientists to publish their experimental and theoretical research in as much detail as possible. Full experimental or methodical details, or both, must be provided for research articles. Computed data or files regarding the full details of the experimental procedure, if unable to be published in a normal way, can be deposited as supplementary material. Nanomaterials is dedicated to a high scientific standard. All manuscripts undergo a rigorous reviewing process and decisions are based on the recommendations of independent reviewers.
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