The role of a tantalum interlayer in enhancing the properties of Fe3O4 thin films.

IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Beilstein Journal of Nanotechnology Pub Date : 2024-10-14 eCollection Date: 2024-01-01 DOI:10.3762/bjnano.15.101
Hai Dang Ngo, Vo Doan Thanh Truong, Van Qui Le, Hoai Phuong Pham, Thi Kim Hang Pham
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引用次数: 0

Abstract

High spin polarization and low resistivity of Fe3O4 at room temperature have been an appealing topic in spintronics with various promising applications. High-quality Fe3O4 thin films are a must to achieve the goals. In this report, Fe3O4 films on different substrates (SiO2/Si(100), MgO(100), and MgO/Ta/SiO2/Si(100)) were fabricated at room temperature with radio-frequency (RF) sputtering and annealed at 450 °C for 2 h. The morphological, structural, and magnetic properties of the deposited samples were characterized with atomic force microscopy, X-ray diffractometry, and vibrating sample magnetometry. The polycrystalline Fe3O4 film grown on MgO/Ta/SiO2/Si(100) presented very interesting morphology and structure characteristics. More importantly, changes in grain size and structure due to the effect of the MgO/Ta buffering layers have a strong impact on saturation magnetization and coercivity of Fe3O4 thin films compared to cases of no or just a single buffering layer.

钽中间层在增强 Fe3O4 薄膜性能方面的作用。
室温下 Fe3O4 的高自旋极化和低电阻率一直是自旋电子学中一个吸引人的话题,其应用前景十分广阔。要实现这些目标,高质量的 Fe3O4 薄膜是必不可少的。本报告采用射频溅射法在室温下制备了不同基底(SiO2/Si(100)、MgO(100)和 MgO/Ta/SiO2/Si(100))上的 Fe3O4 薄膜,并在 450 °C 下退火 2 小时。在 MgO/Ta/SiO2/Si(100) 上生长的多晶 Fe3O4 薄膜呈现出非常有趣的形态和结构特征。更重要的是,与没有缓冲层或只有一个缓冲层的情况相比,由于氧化镁/Ta 缓冲层的影响而导致的晶粒大小和结构变化对 Fe3O4 薄膜的饱和磁化和矫顽力有很大影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Beilstein Journal of Nanotechnology
Beilstein Journal of Nanotechnology NANOSCIENCE & NANOTECHNOLOGY-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
5.70
自引率
3.20%
发文量
109
审稿时长
2 months
期刊介绍: The Beilstein Journal of Nanotechnology is an international, peer-reviewed, Open Access journal. It provides a unique platform for rapid publication without any charges (free for author and reader) – Platinum Open Access. The content is freely accessible 365 days a year to any user worldwide. Articles are available online immediately upon publication and are publicly archived in all major repositories. In addition, it provides a platform for publishing thematic issues (theme-based collections of articles) on topical issues in nanoscience and nanotechnology. The journal is published and completely funded by the Beilstein-Institut, a non-profit foundation located in Frankfurt am Main, Germany. The editor-in-chief is Professor Thomas Schimmel – Karlsruhe Institute of Technology. He is supported by more than 20 associate editors who are responsible for a particular subject area within the scope of the journal.
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