From silicon to silica: a green chemistry approach for hollow sphere nanoparticle formation.

IF 4.6 3区 材料科学 Q2 CHEMISTRY, MULTIDISCIPLINARY
Hennie Marie Johnsen, Anuj Pokle, Werner Filtvedt, Marianne Hiorth, Jo Klaveness, Anja Olafsen Sjåstad
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Abstract

Herein we report on an environmentally friendly and scalable production route for hollow silica spheres (HSSs). The process is based on close to 100% conversion of non-crystalline solid Si nanoparticles ( = 40 ± 9 nm) in mild alkaline solutions (pH ≤ 9.0) at ambient temperature. The Si nanoparticles are prepared using the centrifugal chemical vapor deposition (cCVD) method. Combining transmission electron microscopy (TEM) imaging and nanoparticle size analysis with hydrogen evolution data, elemental mapping, and nitrogen adsorption for surface area measurement, we show for the first time experimental data that document a Kirkendall type Si-to-HSS formation process. Our understanding is that the Si nanoparticles exposed to air form a SiO2 film, which is stable in the mild alkaline environment. Silicon from the Si nanoparticles is transported through the thin SiO2 film and is reacting with H2O/OH- species on the particle surface or in the already thickened SiO2 shell to form silicic acid that in turn rapidly gets converted to a sol-gel to continue the growing of the silica shell. We foresee that this green chemistry approach can be utilized for HSS preparation for use in batteries, insulation materials and drug delivery.

从硅到二氧化硅:形成空心球纳米粒子的绿色化学方法。
在此,我们报告了一种环境友好且可扩展的空心二氧化硅球(HSS)生产路线。该工艺基于非结晶固体硅纳米颗粒(D̄ = 40 ± 9 nm)在温和的碱性溶液(pH ≤ 9.0)中在环境温度下接近 100% 的转化率。硅纳米粒子采用离心化学气相沉积(cCVD)法制备。结合透射电子显微镜(TEM)成像和纳米颗粒尺寸分析、氢演化数据、元素图谱和氮吸附表面积测量,我们首次展示了记录 Kirkendall 型 Si 到 HSS 形成过程的实验数据。我们的理解是,暴露在空气中的硅纳米颗粒会形成一层 SiO2 膜,这层膜在弱碱性环境中是稳定的。硅纳米颗粒中的硅穿过薄薄的二氧化硅薄膜,与颗粒表面或已经增厚的二氧化硅外壳中的 H2O/OH- 物种发生反应,形成硅酸,硅酸又迅速转化为溶胶凝胶,使二氧化硅外壳继续增厚。我们预计,这种绿色化学方法可用于制备 HSS,以用于电池、绝缘材料和药物输送。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Nanoscale Advances
Nanoscale Advances Multiple-
CiteScore
8.00
自引率
2.10%
发文量
461
审稿时长
9 weeks
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