{"title":"Characterization of oscillatory magnetic field-assisted finishing of directed energy deposition NASA HR-1 integral channels","authors":"Kateland Hutt , Justin Rietberg , Paul Gradl , Hitomi Yamaguchi","doi":"10.1016/j.mfglet.2024.09.085","DOIUrl":null,"url":null,"abstract":"<div><div>Additive manufacturing (AM), such as directed energy deposition (DED), enables fabrication of complex geometries for critical parts at near-net shape, but creates a need for post-processing to achieve desired geometry and performance. In particular, parts made using DED are sometimes printed with a high initial surface roughness, requiring post-processing to meet application-dependent requirements. Magnetic field-assisted finishing (MAF), in which a magnetic polishing tool is manipulated by magnetic force and generates relative motion against a target surface, has been applied to smooth AM parts. An advantage of MAF is that the magnetically manipulated polishing tools can finish both external part surfaces and part interiors. In this paper, an oscillating magnetic polishing tool is proposed to smooth the inner surfaces of rectangular NASA HR-1 alloy channels made using DED. Because effective tool motion allows reduction of surface roughness and waviness, parameters that control polishing-tool motion are of great interest. This paper describes three parameters that control polishing-tool motion: number of polishing tools, magnetic field, and abrasive slurry. The effects of tool motion on the polishing characteristics are demonstrated, showing that the roughness of the interior channel surface can be reduced from several tens of micron to a sub-micron level.</div></div>","PeriodicalId":38186,"journal":{"name":"Manufacturing Letters","volume":"41 ","pages":"Pages 670-678"},"PeriodicalIF":1.9000,"publicationDate":"2024-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Manufacturing Letters","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2213846324001482","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, MANUFACTURING","Score":null,"Total":0}
引用次数: 0
Abstract
Additive manufacturing (AM), such as directed energy deposition (DED), enables fabrication of complex geometries for critical parts at near-net shape, but creates a need for post-processing to achieve desired geometry and performance. In particular, parts made using DED are sometimes printed with a high initial surface roughness, requiring post-processing to meet application-dependent requirements. Magnetic field-assisted finishing (MAF), in which a magnetic polishing tool is manipulated by magnetic force and generates relative motion against a target surface, has been applied to smooth AM parts. An advantage of MAF is that the magnetically manipulated polishing tools can finish both external part surfaces and part interiors. In this paper, an oscillating magnetic polishing tool is proposed to smooth the inner surfaces of rectangular NASA HR-1 alloy channels made using DED. Because effective tool motion allows reduction of surface roughness and waviness, parameters that control polishing-tool motion are of great interest. This paper describes three parameters that control polishing-tool motion: number of polishing tools, magnetic field, and abrasive slurry. The effects of tool motion on the polishing characteristics are demonstrated, showing that the roughness of the interior channel surface can be reduced from several tens of micron to a sub-micron level.
增材制造(AM),如定向能沉积(DED),能以接近净形的方式制造复杂几何形状的关键零件,但需要进行后处理,以实现所需的几何形状和性能。特别是,使用定向能沉积技术制造的零件有时会打印出较高的初始表面粗糙度,这就需要进行后处理,以满足与应用相关的要求。磁场辅助精加工(MAF)是通过磁力操纵磁性抛光工具,使其产生与目标表面的相对运动,已被应用于光滑的 AM 零件。磁场辅助抛光的优点是磁力操纵的抛光工具既能抛光零件外表面,也能抛光零件内部。本文提出了一种摆动磁性抛光工具,用于平滑使用 DED 制作的矩形 NASA HR-1 合金通道的内表面。由于有效的工具运动可以减少表面粗糙度和波纹,因此控制抛光工具运动的参数非常重要。本文介绍了控制抛光工具运动的三个参数:抛光工具数量、磁场和研磨浆。结果表明,抛光工具运动对抛光特性的影响可以将通道内表面的粗糙度从几十微米降低到亚微米级。