Investigation of experimental parameters in the electric field and mechanical vibration integrated AFM-based nanopatterning on PEDOT

IF 1.9 Q3 ENGINEERING, MANUFACTURING
Mohammad Alshoul, Xinchen Wang, Zimo Wang, Jia Deng
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引用次数: 0

Abstract

Atomic force microscope (AFM)-based nanomanufacturing offers an affordable and easily deployable method for fabricating high-resolution nanopatterns. This study employs a comprehensive design of experiment (DOE) approach to investigate the effects of various parameters, such as voltage, speed, and vibration axis, on the width and depth of lithography patterns using electrical field and vibration-assisted lithography on PEDOT: PSS films. The DOE explores the effect of voltage and speed on the process of electrical field and vibration-assisted AFM-based nanopatterning in two vibration trajectories: a circular trajectory employing X and Y axis vibration and a reciprocating trajectory employing Y axis vibration. The results indicate that using circular XY-vibration with a low stiffness contact probe and optimized speed and voltage factors results in higher depth and width of the lithography patterns compared to Y-vibration alone at the same parameters as expected. In both cases, pattern width was dominantly controlled by the voltage. Regarding depth, in XY-vibration, the speed of the tip is the most significant factor, while for Y-vibration, voltage plays the most significant role. It is noteworthy that there is a minimum threshold of speed that can produce a pattern; for example, the high-speed level that produced patterns in the circular trajectory (XY-vibration) did not produce patterns in reciprocating motion (Y-vibration). In conclusion, the study demonstrates the significant impact of voltage, speed, and axis on the width and depth of the lithography patterns. These findings can be instrumental in developing and understanding AFM-based high-resolution nanofabrication techniques.
基于原子力显微镜的 PEDOT 纳米图案化的电场和机械振动综合实验参数研究
基于原子力显微镜(AFM)的纳米制造为制造高分辨率纳米图案提供了一种经济实惠、易于部署的方法。本研究采用综合实验设计(DOE)方法,利用电场和振动辅助光刻技术在 PEDOT.PSS 薄膜上研究电压、速度和振动轴等各种参数对光刻图案宽度和深度的影响:PSS 薄膜上光刻图案的宽度和深度的影响。DOE 探讨了电压和速度对基于电场和振动辅助 AFM 的两种振动轨迹的纳米图案刻制过程的影响:一种是采用 X 和 Y 轴振动的圆形轨迹,另一种是采用 Y 轴振动的往复式轨迹。结果表明,在参数相同的情况下,使用带有低刚度接触探针的圆形 XY 轴振动以及优化的速度和电压系数,与单独使用 Y 轴振动相比,光刻图案的深度和宽度更高。在这两种情况下,图案宽度主要由电压控制。关于深度,在 XY 振荡中,针尖的速度是最重要的因素,而对于 Y 振荡,电压则起着最重要的作用。值得注意的是,产生图案的速度有一个最低阈值;例如,在圆形轨迹(XY-振动)中产生图案的高速水平在往复运动(Y-振动)中并不产生图案。总之,这项研究证明了电压、速度和轴对光刻图案宽度和深度的重要影响。这些发现有助于开发和理解基于原子力显微镜的高分辨率纳米制造技术。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Manufacturing Letters
Manufacturing Letters Engineering-Industrial and Manufacturing Engineering
CiteScore
4.20
自引率
5.10%
发文量
192
审稿时长
60 days
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