Preparation of MAPbX3 perovskite thin film materials using in-situ doping atomized deposition methods

IF 3.8 3区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Optical Materials Pub Date : 2024-10-13 DOI:10.1016/j.optmat.2024.116263

Wangchao Wan, Jindou Shi, Chen Zhang, Zheyuan Da, Junnan Wang, Qing Yao, Youlong Xu, Minqiang Wang

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引用次数: 0

Abstract

Thin films of organic halogenated perovskite MAPbX₃ (X = Cl, Br, I or mixed, CH₃NH₃ = MA) display exceptional optical and electronic properties, rendering them highly promising materials for next-generation optoelectronics. However, achieving a large, thin, and smooth film poses a considerable challenge. Compared with the traditional spraying method, the atomized deposition method is able to break down the precursor solution molecules in the atomization system, and this method produces films with thinner thicknesses(800–1000 nm), smoother surfaces, high light transmittance and low surface roughness. By investigating the deposition time, annealing temperature, and film stability associated with the atomized deposition technique, we determined the optimal process parameters for producing nanometer-thick perovskite films. Specifically, we set the precursor solution concentration to 0.1 mmol/L, the deposition time to 450 s, added PVDF (polyvinylidene fluoride) colloid at a concentration of 3 wt%, and maintained an annealing temperature of 80 °C for 20 min. Ultimately, perovskite films with tunable bandgap were prepared for anti-counterfeit marking applications. This method of preparing perovskite films represents a significant advancement towards their commercial utilization in the realm of optoelectronic materials.

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利用原位掺杂雾化沉积法制备 MAPbX3 包晶体薄膜材料

有机卤化过氧化物 MAPbX3（X = Cl、Br、I 或混合，CH3NH3 = MA）薄膜显示出卓越的光学和电子特性，使其成为极具潜力的下一代光电材料。然而，实现大面积、薄而平滑的薄膜是一项相当大的挑战。与传统的喷涂法相比，雾化沉积法能在雾化系统中分解前驱体溶液分子，这种方法能生成厚度更薄（800-1000 nm）、表面更光滑、透光率高和表面粗糙度低的薄膜。通过研究与雾化沉积技术相关的沉积时间、退火温度和薄膜稳定性，我们确定了生产纳米厚的过氧化物薄膜的最佳工艺参数。具体来说，我们将前驱体溶液浓度设定为 0.1 mmol/L，沉积时间设定为 450 秒，加入浓度为 3 wt% 的 PVDF（聚偏氟乙烯）胶体，并将退火温度保持在 80 °C 下 20 分钟。最终，制备出带隙可调的过氧化物薄膜，用于防伪标识应用。这种制备磷光体薄膜的方法标志着在光电材料领域利用磷光体薄膜进行商业化方面取得了重大进展。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Optical Materials 工程技术-材料科学：综合

CiteScore

6.60

自引率

12.80%

发文量

1265

审稿时长

38 days

期刊介绍： Optical Materials has an open access mirror journal Optical Materials: X, sharing the same aims and scope, editorial team, submission system and rigorous peer review. The purpose of Optical Materials is to provide a means of communication and technology transfer between researchers who are interested in materials for potential device applications. The journal publishes original papers and review articles on the design, synthesis, characterisation and applications of optical materials. OPTICAL MATERIALS focuses on: • Optical Properties of Material Systems; • The Materials Aspects of Optical Phenomena; • The Materials Aspects of Devices and Applications. Authors can submit separate research elements describing their data to Data in Brief and methods to Methods X.