{"title":"Superimposing effect of electrocatalytic activity and photocatalytic activity for amorphous NiFe-sulfides photoanode in sulfion oxidation reaction","authors":"Qianqian Huang , Qianyang Chang , Zhenyu Luo , Minfei Xie , Nanbing Jiang , Xiaoning Zhang , Ming Zhou , Yunhuai Zhang , Peng Xiao","doi":"10.1016/j.surfin.2024.105163","DOIUrl":null,"url":null,"abstract":"<div><div>Crystalline transition metal (TM) sulfides exhibit metallic behavior and have been identified as ideal electrocatalytic candidates for electrochemical sulfion oxidation reaction (SOR). However, the SOR performance for amorphous TM sulfides is still poorly understood so far. Herein, we sulfurized NiFeOOH clusters deposited on ZnIn<sub>2</sub>S<sub>4</sub> nanosheets arrays to amorphous NiFe-based sulfides (denoted as NiFeS) for photoelectrochemical SOR. We found amorphous NiFeS presented a n-type semiconductor property, the elaborate band alignment between NiFeS band gap structure and the oxidation potential of S<sup>2−</sup> promoted the superimposing effect of electrocatalytic and photocatalytic current for SOR under illumination. The overall SOR current density of ZnIn<sub>2</sub>S<sub>4</sub>/NiFeS reaches the maximum value about 7.6 mA cm<sup>−2</sup> at 0.6 V vs. RHE after 6 h stability test, which was composed by 2.6 mA cm<sup>−2</sup> electrocatalytic current density and 5.0 mA cm<sup>−2</sup> photocatalytic current density. Our work presents a new strategy for sulfion oxidation reaction based on amorphous transition metal sulfides.</div></div>","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":null,"pages":null},"PeriodicalIF":8.3000,"publicationDate":"2024-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Materials & Interfaces","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2468023024013191","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Crystalline transition metal (TM) sulfides exhibit metallic behavior and have been identified as ideal electrocatalytic candidates for electrochemical sulfion oxidation reaction (SOR). However, the SOR performance for amorphous TM sulfides is still poorly understood so far. Herein, we sulfurized NiFeOOH clusters deposited on ZnIn2S4 nanosheets arrays to amorphous NiFe-based sulfides (denoted as NiFeS) for photoelectrochemical SOR. We found amorphous NiFeS presented a n-type semiconductor property, the elaborate band alignment between NiFeS band gap structure and the oxidation potential of S2− promoted the superimposing effect of electrocatalytic and photocatalytic current for SOR under illumination. The overall SOR current density of ZnIn2S4/NiFeS reaches the maximum value about 7.6 mA cm−2 at 0.6 V vs. RHE after 6 h stability test, which was composed by 2.6 mA cm−2 electrocatalytic current density and 5.0 mA cm−2 photocatalytic current density. Our work presents a new strategy for sulfion oxidation reaction based on amorphous transition metal sulfides.
结晶过渡金属(TM)硫化物表现出金属特性,已被确定为电化学亚硫酰氧化反应(SOR)的理想电催化候选物质。然而,迄今为止,人们对非晶态过渡金属硫化物的硫化性能仍知之甚少。在此,我们将沉积在 ZnIn2S4 纳米片阵列上的 NiFeOOH 簇硫化成非晶态 NiFe 基硫化物(简称为 NiFeS),用于光电化学 SOR。我们发现无定形的 NiFeS 具有 n 型半导体特性,NiFeS 带隙结构与 S2- 氧化电位之间精心设计的带排列促进了光照下 SOR 的电催化电流和光催化电流的叠加效应。经过 6 h 的稳定性测试,ZnIn2S4/NiFeS 的整体 SOR 电流密度在 0.6 V 对 RHE 时达到最大值约 7.6 mA cm-2,由 2.6 mA cm-2 的电催化电流密度和 5.0 mA cm-2 的光催化电流密度组成。我们的工作提出了一种基于无定形过渡金属硫化物的磺胺氧化反应新策略。
期刊介绍:
ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.