Optimization of Selenization Condition for Efficiency CIGSe Solar Cells Based on Postselenization of CuInGa Precursors

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Hanpeng Wang, Daming Zhuang, Ming Zhao, Hao Tong, Mengyao Jia, Junsu Han, Zhihao Wu, Qianming Gong
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Abstract

The degree of selenization of the CIGSe absorbers is controlled by regulating the parameters of the selenization reaction. The structure, element distribution, phase composition of the CIGSe absorbers, and the performances of the solar cells with different selenization degrees are studied. Insufficient selenization will lead to residual Cu2Se phase on the surface and insufficient Na diffusion, which will affect the VCu+ on the surface and the recombination at the front interface. However, excessive selenization will make the MoSe2 layer thicken at the back interface of the CIGSe/Mo, resulting in the increase of the series resistance and the enhancement of the recombination at the back interface. The appropriate selenization degree is conducive to inhibiting the recombination at the front and back interfaces. Improved device performances can be obtained by optimizing the selenization degree of the absorbers.

Abstract Image

基于 CuInGa 前驱体后硒化的高效 CIGSe 太阳能电池硒化条件优化
通过调节硒化反应的参数来控制 CIGSe 吸收体的硒化程度。研究了不同硒化程度的 CIGSe 吸收体的结构、元素分布、相组成以及太阳能电池的性能。硒化不足会导致表面残留 Cu2Se 相,Na 扩散不足,从而影响表面的 VCu+ 和前界面的重组。然而,过度硒化会使 CIGSe/Mo 后界面的 MoSe2 层增厚,从而导致串联电阻增大和后界面的重组增强。适当的硒化程度有利于抑制前后界面的重组。通过优化吸收体的硒化程度,可以提高器件的性能。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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