Recovery of insect-pathogenic fungi from solar UV damage: Molecular mechanisms and prospects.

2区 生物学 Q1 Immunology and Microbiology
Advances in applied microbiology Pub Date : 2024-01-01 Epub Date: 2024-04-27 DOI:10.1016/bs.aambs.2024.04.003
Ming-Guang Feng
{"title":"Recovery of insect-pathogenic fungi from solar UV damage: Molecular mechanisms and prospects.","authors":"Ming-Guang Feng","doi":"10.1016/bs.aambs.2024.04.003","DOIUrl":null,"url":null,"abstract":"<p><p>Molecular mechanisms underlying insect-pathogenic fungal tolerance to solar ultraviolet (UV) damage have been increasingly understood. This chapter reviews the methodology established to quantify fungal response to solar UV radiation, which consists of UVB and UVA, and characterize a pattern of the solar UV dose (damage) accumulated from sunrise to sunset on sunny summer days. An emphasis is placed on anti-UV mechanisms of fungal insect pathogens in comparison to those well documented in model yeast. Principles are discussed for properly timing the application of a fungal pesticide to improve pest control during summer months. Fungal UV tolerance depends on either nucleotide excision repair (NER) or photorepair of UV-induced DNA lesions to recover UV-impaired cells in the darkness or the light. NER is a slow process independent of light and depends on a large family of anti-UV radiation (RAD) proteins studied intensively in model yeast but rarely in non-yeast fungi. Photorepair is a rapid process that had long been considered to depend on only one or two photolyases in filamentous fungi. However, recent studies have greatly expanded a genetic/molecular basis for photorepair-dependent photoreactivation that serves as a primary anti-UV mechanism in insect-pathogenic fungi, in which photolyase regulators required for photorepair and multiple RAD homologs have higher or much higher photoreactivation activities than do photolyases. The NER activities of those homologs in dark reactivation cannot recover the severe UV damage recovered by their activities in photoreactivation. Future studies are expected to further expand the genetic/molecular basis of photoreactivation and enrich principles for the recovery of insect-pathogenic fungi from solar UV damage.</p>","PeriodicalId":7298,"journal":{"name":"Advances in applied microbiology","volume":"129 ","pages":"59-82"},"PeriodicalIF":0.0000,"publicationDate":"2024-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advances in applied microbiology","FirstCategoryId":"99","ListUrlMain":"https://doi.org/10.1016/bs.aambs.2024.04.003","RegionNum":2,"RegionCategory":"生物学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2024/4/27 0:00:00","PubModel":"Epub","JCR":"Q1","JCRName":"Immunology and Microbiology","Score":null,"Total":0}
引用次数: 0

Abstract

Molecular mechanisms underlying insect-pathogenic fungal tolerance to solar ultraviolet (UV) damage have been increasingly understood. This chapter reviews the methodology established to quantify fungal response to solar UV radiation, which consists of UVB and UVA, and characterize a pattern of the solar UV dose (damage) accumulated from sunrise to sunset on sunny summer days. An emphasis is placed on anti-UV mechanisms of fungal insect pathogens in comparison to those well documented in model yeast. Principles are discussed for properly timing the application of a fungal pesticide to improve pest control during summer months. Fungal UV tolerance depends on either nucleotide excision repair (NER) or photorepair of UV-induced DNA lesions to recover UV-impaired cells in the darkness or the light. NER is a slow process independent of light and depends on a large family of anti-UV radiation (RAD) proteins studied intensively in model yeast but rarely in non-yeast fungi. Photorepair is a rapid process that had long been considered to depend on only one or two photolyases in filamentous fungi. However, recent studies have greatly expanded a genetic/molecular basis for photorepair-dependent photoreactivation that serves as a primary anti-UV mechanism in insect-pathogenic fungi, in which photolyase regulators required for photorepair and multiple RAD homologs have higher or much higher photoreactivation activities than do photolyases. The NER activities of those homologs in dark reactivation cannot recover the severe UV damage recovered by their activities in photoreactivation. Future studies are expected to further expand the genetic/molecular basis of photoreactivation and enrich principles for the recovery of insect-pathogenic fungi from solar UV damage.

昆虫病原真菌从太阳紫外线损伤中恢复:分子机制与前景。
人们对昆虫病原真菌耐受太阳紫外线(UV)伤害的分子机制有了越来越多的了解。本章回顾了为量化真菌对太阳紫外线辐射(包括 UVB 和 UVA)的反应而建立的方法,并描述了夏季晴天从日出到日落累积的太阳紫外线剂量(损伤)模式。重点放在真菌昆虫病原体的抗紫外线机制与模型酵母的抗紫外线机制的比较上。讨论了在夏季适当安排真菌杀虫剂施用时间以改善害虫控制的原则。真菌对紫外线的耐受性取决于核苷酸切除修复(NER)或紫外线诱导的 DNA 损伤的光修复,以恢复在黑暗或光照下受紫外线损伤的细胞。核苷酸切除修复是一个与光无关的缓慢过程,依赖于抗紫外线辐射(RAD)蛋白大家族,该蛋白在模式酵母中得到了深入研究,但在非酵母真菌中却很少见。光修复是一个快速过程,长期以来一直被认为只依赖于丝状真菌中的一种或两种光解酶。然而,最近的研究大大扩展了依赖光修复的光复活作用的基因/分子基础,这种光复活作用是昆虫致病真菌的主要抗紫外线机制,其中光修复所需的光解酶调节剂和多个 RAD 同源物的光复活作用活性高于或远高于光解酶。这些同源物在暗再活化中的 NER 活性无法恢复它们在光再活化中的活性所恢复的严重紫外线损伤。未来的研究有望进一步拓展光复活的基因/分子基础,丰富昆虫病原真菌从太阳紫外线损伤中恢复的原理。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Advances in applied microbiology
Advances in applied microbiology 生物-生物工程与应用微生物
CiteScore
8.20
自引率
0.00%
发文量
16
审稿时长
>12 weeks
期刊介绍: Advances in Applied Microbiology offers intensive reviews of the latest techniques and discoveries in this rapidly moving field. The editors are recognized experts and the format is comprehensive and instructive. Published since 1959, Advances in Applied Microbiology continues to be one of the most widely read and authoritative review sources in microbiology. Recent areas covered include bacterial diversity in the human gut, protozoan grazing of freshwater biofilms, metals in yeast fermentation processes and the interpretation of host-pathogen dialogue through microarrays.
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