Bias voltage modulated electric transport properties in Fe65Co35/Hf0.5Zr0.5O2 films

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2024-09-23 DOI:10.1016/j.vacuum.2024.113675

引用次数: 0

Abstract

We demonstrate the bias voltage modulated electric transport properties in Fe₆₅Co₃₅ (FeCo) films deposited on Hf_0.5Zr_0.5O₂ (HZO) films. Intrinsic multiferroicity have been characterized for the FeCo/HZO heterostructures by analyzing the ferroelectric polarizations and imaging the magnetic domains. We show that, upon the application of bias voltages on the FeCo/HZO heterostructures, the current-voltage (I-V) curves of FeCo films can be regulated, giving rise to different resistance states, enabled partly by strain-mediated magnetoelectric coupling effect. The strain coupling effect between HZO and FeCo films is elucidated by simulating the volumetric strain of the FeCo/HZO films under the action of applied voltages. Through additional analysis, the bias voltage modulated electric transport properties could also be linked with charge-mediated magnetoelectric coupling effect. We anticipate that our work will inspire further studies on low-power consumption and high-density electronic devices.

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Fe65Co35/Hf0.5Zr0.5O2 薄膜中的偏置电压调制电输运特性

我们展示了沉积在 Hf0.5Zr0.5O2 (HZO) 薄膜上的 Fe65Co35 (FeCo) 薄膜的偏压调制电输运特性。通过分析铁电极化和磁畴成像，对 FeCo/HZO 异质结构的内在多铁性进行了表征。我们的研究表明，当在铁钴/HZO 异质结构上施加偏置电压时，铁钴薄膜的电流-电压（I-V）曲线可以调节，从而产生不同的电阻状态，这部分是通过应变介导的磁电耦合效应实现的。通过模拟外加电压作用下 FeCo/HZO 薄膜的体积应变，阐明了 HZO 和 FeCo 薄膜之间的应变耦合效应。通过进一步分析，偏置电压调制的电传输特性还可能与电荷介导的磁电耦合效应有关。我们预计，我们的工作将激励人们进一步研究低功耗和高密度电子器件。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.