Control of chiral damping in magnetic trilayers using He+ ion irradiation

IF 3.5 2区 物理与天体物理 Q2 PHYSICS, APPLIED
Rakhul Raj, K. Saravanan, S. Amirthapandian, V. Raghavendra Reddy
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引用次数: 0

Abstract

In the forefront of spintronic advancements, structures with strong perpendicular magnetic anisotropy (PMA) such as Pt/Co/Pt are essential for the miniaturization and performance enhancement of high-density magnetic storage technologies. The robust PMA characteristic of these systems facilitates the development of scalable spintronic devices, crucial for next-generation magnetic memory applications. This study investigates the interplay between PMA and the Dzyaloshinskii-Moriya interaction (DMI)—an antisymmetric exchange interaction prevalent in non-centrosymmetric magnetic systems—and its dissipative counterpart, chiral damping. While chiral damping arises from the same broken inversion symmetry as DMI, it typically introduces an additional energy dissipation channel, reducing device efficiency. Our research examines the effects of controlled helium ion (He+) irradiation on a Pt/Co/Pt system. We find that ion beam irradiation enhances interfacial intermixing, which correlates with a decrease in PMA. However, domain wall velocity measurements indicate a concurrent reduction in both DMI and chiral damping, along with enhanced velocities as irradiation fluence increases. These observations suggest that ion beam irradiation can be judiciously applied to achieve a balance between lower DMI, chiral damping, and reasonable PMA, thereby optimizing the system for improved device performance.
利用 He+ 离子辐照控制磁性三层膜中的手性阻尼
铂/钴/铂等具有强垂直磁各向异性(PMA)的结构是自旋电子技术发展的前沿,对于高密度磁存储技术的微型化和性能提升至关重要。这些系统强大的 PMA 特性有助于开发可扩展的自旋电子器件,这对下一代磁存储器的应用至关重要。本研究探讨了 PMA 与 Dzyaloshinskii-Moriya 相互作用(DMI)--非中心对称磁性系统中普遍存在的一种反对称交换相互作用--及其耗散对应物手性阻尼之间的相互作用。虽然手性阻尼与 DMI 一样产生于被破坏的反转对称性,但它通常会引入额外的能量耗散通道,从而降低器件效率。我们的研究考察了受控氦离子(He+)辐照对铂/钴/铂系统的影响。我们发现,离子束辐照增强了界面混合,这与 PMA 的减少有关。然而,域壁速度测量结果表明,随着辐照通量的增加,DMI 和手性阻尼同时减小,速度增强。这些观察结果表明,离子束辐照可以明智地应用于实现较低的 DMI、手性阻尼和合理的 PMA 之间的平衡,从而优化系统以提高器件性能。
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来源期刊
Applied Physics Letters
Applied Physics Letters 物理-物理:应用
CiteScore
6.40
自引率
10.00%
发文量
1821
审稿时长
1.6 months
期刊介绍: Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.
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