Thermal stability of gold films on titanium-adhered silicon substrate

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2024-09-12 DOI:10.1016/j.vacuum.2024.113645

引用次数: 0

Abstract

In this study, thermally induced changes in the surface of a thin gold film deposited on Si(100) with a 5 nm thick titanium adhesion layer were investigated. The analysis involved X-ray photoelectron spectroscopy, low-energy electron diffraction, and scanning tunnelling microscopy. The sample was subjected to stepwise annealing under ultra-high vacuum conditions at temperatures ranging from 430 to 1330 K. Low-temperature annealing up to 450 K did not alter the morphology but improved the cleanliness of the gold film surface. Annealing between 530 and 930 K resulted in the disintegration of the gold film, along with mixing and interaction between the sample components. Annealing the sample at 980 K led to the emergence of a gold silicide surface on Si(100) exhibiting the (5 × 3.2)R5.7° reconstruction.

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钛粘合硅衬底上金薄膜的热稳定性

本研究调查了沉积在具有 5 纳米厚钛粘附层的 Si（100）上的金薄膜表面的热诱导变化。分析包括 X 射线光电子能谱、低能电子衍射和扫描隧道显微镜。样品在 430 至 1330 K 的超高真空条件下进行了逐步退火。在 530 至 930 K 之间退火会导致金膜解体，同时样品成分之间也会发生混合和相互作用。样品在 980 K 退火后，硅（100）上出现了硅化金表面，呈现出 (5 × 3.2)R5.7° 重构。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.