Plasma Chemical Deposition of Hydrogenated DLC Films with Different Hydrogen and sp3-Hybrid Carbon Content

IF 0.6 4区物理与天体物理 Q4 PHYSICS, CONDENSED MATTER

Semiconductors Pub Date : 2024-08-30 DOI:10.1134/s1063782624010123

A. I. Okhapkin, M. N. Drozdov, P. A. Yunin, S. A. Kraev, D. B. Radishev

引用次数: 0

Abstract

The influence of methane plasma parameters on the deposition rate and on the content of the hydrogen and the sp³-carbon fraction in hydrogenated diamond-like carbon films (DLC) was investigated. It was shown that the proportion of the sp³-carbon fraction mainly depends on the inductive power and the argon addition to the plasma; the latter also contributes to a decrease of hydrogen in the films.

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不同氢含量和 sp3 杂化碳含量的氢化 DLC 薄膜的等离子化学沉积

摘要研究了甲烷等离子体参数对氢化类金刚石碳薄膜（DLC）沉积速率、氢含量和 sp3 碳组分的影响。结果表明，sp3 碳部分的比例主要取决于感应功率和等离子体中的氩气添加量；后者还有助于减少薄膜中的氢含量。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Semiconductors 物理-物理：凝聚态物理

CiteScore

1.50

自引率

28.60%

发文量

131

审稿时长

3-6 weeks

期刊介绍： Publishes the most important work in semiconductor research in the countries of the former Soviet Union. Covers semiconductor theory, transport phenomena in semiconductors, optics, magnetooptics, and electrooptics of semiconductors, semiconductor lasers and semiconductor surface physics. The journal features an extensive book review section.