Influence of the Silicon Deposition on the Industrial Silicon Trapping Catalyst

IF 0.6 4区 化学 Q4 CHEMISTRY, APPLIED
Xiaozhen Chen, Li Liu, Chengmin Yang, Bumei Zheng, Xiaoying Yin, Jin Sun, Yunhai Yao, Weiyu Duan
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引用次数: 0

Abstract

The structure and surface properties of the industrial silicon trapping catalysts were characterized by XRF, XPS, XRD, NH3-TPD and NMR. The silicon trapping mechanism of the industrial silicon trapping catalyst was discussed. The results showed that the silicon capacity reached 28.17% during this lifetime. The captured silicon mainly existed on the surface of the silicon trapping catalyst as amorphous silicon with abundant Q species including Si(OSi)4, Si(OSi)3(OX), Si(OSi)2(OX)2, and Si(OSi)(OX)3, proving the silicon was caputured as the amorphous silicon bilayer deposition model. After silicon deposition, the pore properties of the silicon trapping catalyst changed greatly. Compared with the fresh catalyst, the specific surface area and pore volume of the spent industrial silicon trapping catalyst decreased by 49.17% and 22.92% respectively. The deposition of silicon leaded to the loss of acid sites and changed the interaction between the support and the active metal, which result in the reduction of the number of active metal species. This may explain how the deposited silicon is related to the deactivation of the hydrotreating catalysts.

Abstract Image

Abstract Image

硅沉积对工业硅捕集催化剂的影响
摘要 利用 XRF、XPS、XRD、NH3-TPD 和 NMR 对工业硅捕集催化剂的结构和表面性质进行了表征。讨论了工业硅捕集催化剂的硅捕集机理。结果表明,在此寿命期间,硅容量达到了 28.17%。捕获的硅主要以无定形硅的形式存在于硅捕集催化剂的表面,其中含有丰富的 Q 种类,包括 Si(OSi)4、Si(OSi)3(OX)、Si(OSi)2(OX)2 和 Si(OSi)(OX)3,证明硅被认定为无定形硅双层沉积模型。硅沉积后,硅捕集催化剂的孔性能发生了很大变化。与新催化剂相比,废工业硅捕集催化剂的比表面积和孔体积分别减少了 49.17% 和 22.92%。硅的沉积导致了酸性位点的丧失,并改变了载体与活性金属之间的相互作用,从而导致活性金属种类数量的减少。这可以解释沉积硅与加氢处理催化剂失活的关系。
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来源期刊
CiteScore
1.60
自引率
11.10%
发文量
63
审稿时长
2-4 weeks
期刊介绍: Russian Journal of Applied Chemistry (Zhurnal prikladnoi khimii) was founded in 1928. It covers all application problems of modern chemistry, including the structure of inorganic and organic compounds, kinetics and mechanisms of chemical reactions, problems of chemical processes and apparatus, borderline problems of chemistry, and applied research.
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