Plasmon scattering at a junction in double-layer two-dimensional electron gas plasmonic waveguide

IF 3.1 3区 物理与天体物理 Q2 PHYSICS, APPLIED
Hanghui Deng, Shengpeng Yang, Hongyang Guo, Zijian Qiu, Ping Zhang, Shaomeng Wang, Zhanliang Wang, Zhigang Lu, Yuan Zheng, Yubin Gong
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Abstract

The scattering of plasmons at a junction within a double-layer two-dimensional electron gas plasmonic waveguide is studied via a full electromagnetic method. The dispersion relation is derived by utilizing the transfer matrix method and can be extended to the situation of an arbitrary number of layers. By numerically solving the dispersion equations, both the acoustic and optical plasmon modes are identified in this double layer system, and the unstable plasmon modes arising from plasmon coupling in different layers are discussed elaborately. Subsequently, the total fields are expanded with eigenmodes and matched at the interface to analyze the scattering characteristics at the junction. The results indicate that the total power of the plasmon mode is amplified when the electron fluid flows from a high concentration region to a low concentration region, and the amplification is more evident at a higher drift velocity. Additionally, we address the scattering of unstable plasmons caused by the two-stream instability and find that the transmitted plasmons are excited intensively at the incidence of the growing plasmon, leading to the plasmon amplification. The detailed examination of plasmon scattering at junction is the prerequisite for studying more complex structures of terahertz plasmonic devices and comprehending the corresponding amplification mechanism.
双层二维电子气等离子体波导交界处的等离子体散射
本文通过全电磁方法研究了双层二维电子气质子波导内交界处的质子散射。利用传递矩阵法推导出了色散关系,并可扩展到任意层数的情况。通过数值求解频散方程,确定了双层系统中的声学和光学等离子体模式,并详细讨论了不同层等离子体耦合产生的不稳定等离子体模式。随后,用特征模展开总场,并在界面上进行匹配,以分析交界处的散射特性。结果表明,当电子流体从高浓度区流向低浓度区时,等离子体模式的总功率会被放大,而且在漂移速度较高时,放大效果更为明显。此外,我们还研究了双流不稳定性引起的不稳定质子散射,发现传输的质子在增长的质子入射处被强烈激发,从而导致质子放大。详细研究交界处的等离子体散射是研究结构更复杂的太赫兹等离子体器件和理解相应放大机制的先决条件。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Journal of Physics D: Applied Physics
Journal of Physics D: Applied Physics 物理-物理:应用
CiteScore
6.80
自引率
8.80%
发文量
835
审稿时长
2.1 months
期刊介绍: This journal is concerned with all aspects of applied physics research, from biophysics, magnetism, plasmas and semiconductors to the structure and properties of matter.
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