Electron density mapping using maximum entropy method and room temperature magnetism in Cr3+ substituted SnS2

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
N. Pavithra, M. Charles Robert
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Abstract

Powder X-ray diffraction (XRD) data were used to analyze the electrical and local structure of dilute magnetic materials, namely SnS2 substituted with 2.5%, 5%, and 7.5% chromium (Cr3+). These materials are magnetic semiconductors with applications in spintronics, half metals, and valleytronics. This study uses XRD data to investigate the electron density mapping and bonding behavior of 3D and 2D MEM (maximum entropy method). It also looks at interstitial charge buildup that occurs outside of the normal lattice. Adding Cr3+ to pure Tin disulfide (SnS2) results in mild magnetic properties, with a maximum magnetization of (0.0077, 0.0174, and 0.0322) emu/g and a coercivity of (169.9, 166.2, and 110.3) Oe at 2.5%, 5%, and 7.5% Cr3+ concentrations, respectively. When using MEM electron density analysis, there is a substantial link between magnetic saturation and coercivity. SnS2 substituted with 7.5% Cr3+ exhibits the lowest interstitial charge, leading to a higher magnetic field. The analysis of cation deficiencies using XRD data is utilized to investigate optical absorption and energy gap manipulation. According to photoluminescence (PL) emission studies, the presence of Cr3+ substitution has no direct effect on SnS2 systems. Substitution of Cr3+ in SnS2 increases the vacancy/interstitial charge, resulting in an indirect link with photoluminescence (PL) output. Electron spin resonance (ESR) analysis reveals the presence of both interstitial and substitutional Cr3+ ions. SEM/HRTEM with SAED reveals the polycrystalline nature of the samples with grains. The study revealed a link between charge buildup at substitutional and interstitial sites, bonding type and strength, and physical properties such as magnetic and optical properties.

Abstract Image

使用最大熵法绘制 Cr3+ 取代 SnS2 中的电子密度图和室温磁性
粉末 X 射线衍射 (XRD) 数据用于分析稀磁材料的电性和局部结构,即用 2.5%、5% 和 7.5% 铬 (Cr3+) 替代的 SnS2。这些材料是磁性半导体,可应用于自旋电子学、半金属和谷电子学。本研究利用 XRD 数据研究三维和二维 MEM 的电子密度图和成键行为(最大熵法)。它还研究了正常晶格之外的间隙电荷堆积。在纯二硫化锡(SnS2)中添加 Cr3+ 会产生温和的磁性,在 Cr3+ 浓度为 2.5%、5% 和 7.5% 时,最大磁化率分别为 (0.0077, 0.0174, and 0.0322) emu/g,矫顽力分别为 (169.9, 166.2, and 110.3) Oe。使用 MEM 电子密度分析时,磁饱和度与矫顽力之间存在实质性联系。用 7.5% Cr3+ 取代的 SnS2 显示出最低的间隙电荷,从而导致更高的磁场。利用 XRD 数据对阳离子缺陷进行分析,可用于研究光吸收和能隙操作。根据光致发光(PL)发射研究,Cr3+ 取代的存在对 SnS2 系统没有直接影响。在 SnS2 中取代 Cr3+ 会增加空位/间隙电荷,从而与光致发光(PL)输出产生间接联系。电子自旋共振(ESR)分析显示存在间隙离子和置换离子 Cr3+。带有 SAED 的 SEM/HRTEM 显示了样品的多晶性质和晶粒。该研究揭示了置换位点和间隙位点的电荷积累、键合类型和强度与磁性和光学特性等物理性质之间的联系。
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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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