Probing the Structural, Mechanical, Electronic and Optical Properties of TlGeX3 (X = Cl, Br, I) for Optoelectronic Applications

IF 3.9 3区 化学 Q2 POLYMER SCIENCE
A. Afaq, Abu Bakar, Muhammad Ahmed, Saff e Awal Akhtar, Shahid M. Ramay
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引用次数: 0

Abstract

The current study utilizes first principles calculations based on density functional theory to investigate structural, elastic, mechanical, electronic and optical properties of Lead free Thallium based halide perovskites \({\text{TlGeX}_{3}}\) (X = Cl, Br, I) for their potential application in photovoltaic technology. The optimized lattice constants of \({\text{TlGeCl}}_{3}\), \({\text{TlGeBr}}_{3}\) and \({\text{TlGeI}}_{3}\) are 5.272 Å, 5.527 Å and 5.900 Å. These optimized lattice constants are used to compute the elastic constants, \({\text{C}}_{11}\), \({\text{C}}_{12}\) and \({\text{C}}_{44}\). In addition to elastic moduli like shear, bulk, and Young’s modulus, we have calculated the different mechanical parameters, Poisson’s ratio, Pugh’s ratio and Cauchy pressure. These materials proved to be mechanically stable. The electronic properties including electronic band profile, and density of states were obtained using Perdew Burke Ernzerhof, GGA-PBE, Tran-Blaha modified Becke–Johnson, TB-mBJ, and meta GGA, Strongly Constrained and Appropriately Normed, SCAN exchange and correlation functionals. The electronic band gaps of \({\text{TlGeCl}}_{3}\), \({\text{TlGeBr}}_{3}\) and \({\text{TlGeI}}_{3}\) are 1.41 eV, 1.01 eV and 0.74 eV using TB-mBJ and these perovskites have direct band gap. The optical response of \({\text{TlGeX}}_{3}\) (X = Cl, Br, I) against incident electromagnetic radiation upto 30 eV is calculated by exploring absorption coefficient, optical conductivity, dielectric constants, refraction and energy loss with variety of methods. The electronic and optical properties revealed that \({\text{TlGeX}}_{3}\) (X = Cl, Br, I) can be utilized in the optoelectronic device fabrications being a narrow band gap with high absorption and optical conductivity.

Abstract Image

探索用于光电应用的 TlGeX3(X = Cl、Br、I)的结构、机械、电子和光学特性
本研究利用基于密度泛函理论的第一性原理计算,研究了无铅铊基卤化物包晶石(X = Cl、Br、I)的结构、弹性、机械、电子和光学特性,以探讨其在光伏技术中的潜在应用。优化后的({text/{TlGeCl}}_{3}})、({text/{TlGeBr}}_{3}})和({text/{TlGeI}}_{3}})晶格常数分别为 5.272 Å、5.527 Å 和 5.900 Å。这些优化的晶格常数被用来计算弹性常数:\({\text{C}}_{11}/\)、\({\text{C}}_{12}/\)和\({\text{C}}_{44}/\)。除了剪切模量、体积模量和杨氏模量等弹性模量外,我们还计算了不同的力学参数、泊松比、普氏比和考奇压力。事实证明,这些材料具有良好的机械稳定性。我们使用 Perdew Burke Ernzerhof、GGA-PBE、Tran-Blaha modified Becke-Johnson、TB-mBJ 和 meta GGA、Strongly Constrained and Appriately Normed、SCAN 交换和相关函数获得了包括电子能带剖面和状态密度在内的电子特性。使用TB-mBJ计算出的({text{TlGeCl}}_{3}/\)、({text{TlGeBr}}_{3}/\)和({text{TlGeI}}_{3}/\)的电子带隙分别为1.41 eV、1.01 eV和0.74 eV,这些过氧化物具有直接带隙。通过探索吸收系数、光导率、介电常数、折射率和能量损失等多种方法,计算了 \({text{TlGeX}}_{3}\) (X = Cl、Br、I)对 30 eV 以下入射电磁辐射的光学响应。电子和光学特性表明,\({text{TlGeX}}_{3}\) (X = Cl、Br、I)是一种具有高吸收率和光导率的窄带隙,可用于光电器件制造。
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来源期刊
CiteScore
8.30
自引率
7.50%
发文量
335
审稿时长
1.8 months
期刊介绍: Journal of Inorganic and Organometallic Polymers and Materials [JIOP or JIOPM] is a comprehensive resource for reports on the latest theoretical and experimental research. This bimonthly journal encompasses a broad range of synthetic and natural substances which contain main group, transition, and inner transition elements. The publication includes fully peer-reviewed original papers and shorter communications, as well as topical review papers that address the synthesis, characterization, evaluation, and phenomena of inorganic and organometallic polymers, materials, and supramolecular systems.
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