Analysis of Monte-Carlo collision method with argon and helium background gases at different RF-powers and pressures in ELTRAP device

IF 6 2区 工程技术 Q1 ENGINEERING, MULTIDISCIPLINARY
Hassan Ali, Nisar Ali, Ahmed Sayed M. Metwally, Arshad Ali, Musarrat Jabeen
{"title":"Analysis of Monte-Carlo collision method with argon and helium background gases at different RF-powers and pressures in ELTRAP device","authors":"Hassan Ali, Nisar Ali, Ahmed Sayed M. Metwally, Arshad Ali, Musarrat Jabeen","doi":"10.1016/j.asej.2024.102999","DOIUrl":null,"url":null,"abstract":"The impact of confined excited electron with argon and helium background gases is systematically studied using Monte-Carlo particle-in-cell simulations for various low powers (1.0–8.0 V) and pressures (1.50 × 10 Torr and 3.75 × 10 Torr) in ELTRAP device. The results of these numerical studies showed that the heating effect of the excited confined electron plasma density of 5 × 10 m within the Brillouin limit () resulted a higher temperature (eV) and increased collision time in argon as a background gas as compared to helium gas. The axial temperature (eV) has a higher value than the radial temperature (eV) and increases with the increase in RF-Powers and pressures. The maximum kinetic energy of excited confined electrons occurred in the range of 0.03–0.04 m radially due to the maximum self-electric field intensity in simulation time up to 20 µs. The electric field decreases when the collision frequency is increased. The secondary electron production and ionization are higher than expected at a background pressure of 1.50 × 10 Torr as compared to 3.75 × 10 Torr. The remaining secondary electrons were always ejected from the symmetry axis of the device. It was observed that the production of secondary electrons is proportional to the ionization rate.","PeriodicalId":48648,"journal":{"name":"Ain Shams Engineering Journal","volume":null,"pages":null},"PeriodicalIF":6.0000,"publicationDate":"2024-08-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Ain Shams Engineering Journal","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1016/j.asej.2024.102999","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"ENGINEERING, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

Abstract

The impact of confined excited electron with argon and helium background gases is systematically studied using Monte-Carlo particle-in-cell simulations for various low powers (1.0–8.0 V) and pressures (1.50 × 10 Torr and 3.75 × 10 Torr) in ELTRAP device. The results of these numerical studies showed that the heating effect of the excited confined electron plasma density of 5 × 10 m within the Brillouin limit () resulted a higher temperature (eV) and increased collision time in argon as a background gas as compared to helium gas. The axial temperature (eV) has a higher value than the radial temperature (eV) and increases with the increase in RF-Powers and pressures. The maximum kinetic energy of excited confined electrons occurred in the range of 0.03–0.04 m radially due to the maximum self-electric field intensity in simulation time up to 20 µs. The electric field decreases when the collision frequency is increased. The secondary electron production and ionization are higher than expected at a background pressure of 1.50 × 10 Torr as compared to 3.75 × 10 Torr. The remaining secondary electrons were always ejected from the symmetry axis of the device. It was observed that the production of secondary electrons is proportional to the ionization rate.
分析 ELTRAP 设备中不同射频功率和压力下氩气和氦气背景气体的蒙特卡洛碰撞方法
在 ELTRAP 装置中,使用蒙特卡洛粒子池模拟法系统地研究了不同低功率(1.0-8.0 V)和压力(1.50 × 10 托和 3.75 × 10 托)下受激电子与氩气和氦气背景气体的影响。数值研究结果表明,在布里渊极限()内,5 × 10 m 的受激约束电子等离子体密度的加热效应导致氩气作为背景气体与氦气相比温度(eV)更高,碰撞时间更长。轴向温度(eV)高于径向温度(eV),并且随着射频功率和压力的增加而增加。受激约束电子的最大动能出现在 0.03-0.04 m 的径向范围内,这是因为在模拟时间达到 20 µs 时,自电场强度达到最大。碰撞频率越高,电场强度越低。与 3.75 × 10 托相比,在 1.50 × 10 托的背景压力下,二次电子的产生和电离高于预期。剩余的二次电子总是从装置的对称轴上射出。据观察,二次电子的产生与电离率成正比。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
Ain Shams Engineering Journal
Ain Shams Engineering Journal Engineering-General Engineering
CiteScore
10.80
自引率
13.30%
发文量
441
审稿时长
49 weeks
期刊介绍: in Shams Engineering Journal is an international journal devoted to publication of peer reviewed original high-quality research papers and review papers in both traditional topics and those of emerging science and technology. Areas of both theoretical and fundamental interest as well as those concerning industrial applications, emerging instrumental techniques and those which have some practical application to an aspect of human endeavor, such as the preservation of the environment, health, waste disposal are welcome. The overall focus is on original and rigorous scientific research results which have generic significance. Ain Shams Engineering Journal focuses upon aspects of mechanical engineering, electrical engineering, civil engineering, chemical engineering, petroleum engineering, environmental engineering, architectural and urban planning engineering. Papers in which knowledge from other disciplines is integrated with engineering are especially welcome like nanotechnology, material sciences, and computational methods as well as applied basic sciences: engineering mathematics, physics and chemistry.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信