Towards ZnO-Based Near-Infra-Red Radiation Detectors: Performance Improvement via Si Nanoclusters Embedment

IF 1.8 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Victor-Tapio Rangel-Kuoppa, Dante Rodrigo Alfaro-Flores, Angel Guillen-Cervantes, Francisco de Moure-Flores, Miguel Ángel Meléndez-Lira
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Abstract

Si nanoparticles embedded in a ZnO matrix were produced by a sequential deposition of ZnO/Si/ZnO layers, by radio frequency sputtering. Sample growth temperatures of 25 °C, 300 °C, and 500 °C were used to deposit ZnO/Si/ZnO layers on soda lime glass and p-type silicon substrates; ZnO layers were deposited by reactive radio-frequency sputtering employing a mixture of Ar/O2, with a ratio of 66/33, as working atmosphere. The type of substrate and the growth temperature affect the first ZnO layer roughness, promoting the formation of silicon nanoparticles, matrix characteristics, and as consequence, spectral response. The roughness of the initial ZnO layer is transferred to the top layer of ZnO, and it can be tailored between 65 and 370 Å, depending on the sample growth temperature. Transmission electron microscopy show that substrate temperature mainly affects the density of silicon nanoparticles rather than their size. ZnO/Si/ZnO films deposited on p-type silicon substrate were processed and photosensors were obtained, showing a selective response in the 950 to 1150 nm wavelength range, making them suitable candidates for near infrared detectors.
基于氧化锌的近红外辐射探测器:通过嵌入硅纳米团簇提高性能
通过射频溅射连续沉积氧化锌/二氧化硅/氧化锌层,产生了嵌入氧化锌基体的硅纳米粒子。样品生长温度分别为 25 ℃、300 ℃ 和 500 ℃,用于在钠钙玻璃和 p 型硅衬底上沉积 ZnO/Si/ZnO 层;采用反应射频溅射法沉积 ZnO 层,工作气氛为氩气/氧气混合物(比例为 66/33)。衬底类型和生长温度会影响第一层氧化锌层的粗糙度,促进硅纳米颗粒的形成,影响基质特性,进而影响光谱响应。初始氧化锌层的粗糙度会转移到氧化锌顶层,根据样品生长温度的不同,粗糙度可在 65 至 370 Å 之间定制。透射电子显微镜显示,衬底温度主要影响硅纳米颗粒的密度,而不是它们的尺寸。对沉积在 p 型硅衬底上的 ZnO/Si/ZnO 薄膜进行了处理,并获得了光传感器,在 950 至 1150 纳米波长范围内显示出选择性响应,使其成为近红外探测器的合适候选材料。
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来源期刊
ECS Journal of Solid State Science and Technology
ECS Journal of Solid State Science and Technology MATERIALS SCIENCE, MULTIDISCIPLINARY-PHYSICS, APPLIED
CiteScore
4.50
自引率
13.60%
发文量
455
期刊介绍: The ECS Journal of Solid State Science and Technology (JSS) was launched in 2012, and publishes outstanding research covering fundamental and applied areas of solid state science and technology, including experimental and theoretical aspects of the chemistry and physics of materials and devices. JSS has five topical interest areas: carbon nanostructures and devices dielectric science and materials electronic materials and processing electronic and photonic devices and systems luminescence and display materials, devices and processing.
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