{"title":"Competing behavior of interface delamination and wafer cracking during peeling film from ultra-thin wafer","authors":"Wei Jian , Hanbin Yin , Ying Chen , Xue Feng","doi":"10.1016/j.ijsolstr.2024.113058","DOIUrl":null,"url":null,"abstract":"<div><p>Peeling the front-side film from the flexible and ultra-thin wafer is a critical procedure for the fabrication of ultra-thin chips. For a successful peeling process, the following conditions are required simultaneously: the interface between the film and the wafer is debonded, the interface between the wafer and the substrate remains undelaminated, and the wafer stays intact. However, there are relatively few studies focusing on the underlying mechanism in this peeling process. Here, a theoretical model is developed to investigate the competing behavior of interface delamination and wafer cracking for the bilayer film-substrate system. Based on the constant-stress (Dugdale) cohesive law and Euler-Bernoulli beam theory, both the competing interface delamination criterion and the wafer cracking criterion are determined. The corresponding competing maps of interface delamination and wafer cracking are obtained, in which the interface delamination path and the wafer safety status can be predicted. The effect of several dimensionless parameters on the competing behavior of interface delamination and wafer cracking is examined systematically, including the property of the geometry, the material, and the interface of the bilayer film-substrate system. The theoretical model is validated by both finite element analysis (FEA) and experimental results. This research aims to provide some guidance for optimizing the peeling parameters and contribute to a higher success rate of peeling process.</p></div>","PeriodicalId":14311,"journal":{"name":"International Journal of Solids and Structures","volume":"305 ","pages":"Article 113058"},"PeriodicalIF":3.4000,"publicationDate":"2024-09-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal of Solids and Structures","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0020768324004177","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MECHANICS","Score":null,"Total":0}
引用次数: 0
Abstract
Peeling the front-side film from the flexible and ultra-thin wafer is a critical procedure for the fabrication of ultra-thin chips. For a successful peeling process, the following conditions are required simultaneously: the interface between the film and the wafer is debonded, the interface between the wafer and the substrate remains undelaminated, and the wafer stays intact. However, there are relatively few studies focusing on the underlying mechanism in this peeling process. Here, a theoretical model is developed to investigate the competing behavior of interface delamination and wafer cracking for the bilayer film-substrate system. Based on the constant-stress (Dugdale) cohesive law and Euler-Bernoulli beam theory, both the competing interface delamination criterion and the wafer cracking criterion are determined. The corresponding competing maps of interface delamination and wafer cracking are obtained, in which the interface delamination path and the wafer safety status can be predicted. The effect of several dimensionless parameters on the competing behavior of interface delamination and wafer cracking is examined systematically, including the property of the geometry, the material, and the interface of the bilayer film-substrate system. The theoretical model is validated by both finite element analysis (FEA) and experimental results. This research aims to provide some guidance for optimizing the peeling parameters and contribute to a higher success rate of peeling process.
期刊介绍:
The International Journal of Solids and Structures has as its objective the publication and dissemination of original research in Mechanics of Solids and Structures as a field of Applied Science and Engineering. It fosters thus the exchange of ideas among workers in different parts of the world and also among workers who emphasize different aspects of the foundations and applications of the field.
Standing as it does at the cross-roads of Materials Science, Life Sciences, Mathematics, Physics and Engineering Design, the Mechanics of Solids and Structures is experiencing considerable growth as a result of recent technological advances. The Journal, by providing an international medium of communication, is encouraging this growth and is encompassing all aspects of the field from the more classical problems of structural analysis to mechanics of solids continually interacting with other media and including fracture, flow, wave propagation, heat transfer, thermal effects in solids, optimum design methods, model analysis, structural topology and numerical techniques. Interest extends to both inorganic and organic solids and structures.