Competing behavior of interface delamination and wafer cracking during peeling film from ultra-thin wafer

IF 3.4 3区 工程技术 Q1 MECHANICS
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Abstract

Peeling the front-side film from the flexible and ultra-thin wafer is a critical procedure for the fabrication of ultra-thin chips. For a successful peeling process, the following conditions are required simultaneously: the interface between the film and the wafer is debonded, the interface between the wafer and the substrate remains undelaminated, and the wafer stays intact. However, there are relatively few studies focusing on the underlying mechanism in this peeling process. Here, a theoretical model is developed to investigate the competing behavior of interface delamination and wafer cracking for the bilayer film-substrate system. Based on the constant-stress (Dugdale) cohesive law and Euler-Bernoulli beam theory, both the competing interface delamination criterion and the wafer cracking criterion are determined. The corresponding competing maps of interface delamination and wafer cracking are obtained, in which the interface delamination path and the wafer safety status can be predicted. The effect of several dimensionless parameters on the competing behavior of interface delamination and wafer cracking is examined systematically, including the property of the geometry, the material, and the interface of the bilayer film-substrate system. The theoretical model is validated by both finite element analysis (FEA) and experimental results. This research aims to provide some guidance for optimizing the peeling parameters and contribute to a higher success rate of peeling process.

从超薄晶片剥离薄膜时界面脱层和晶片开裂的竞争行为
从柔性超薄晶片上剥离正面薄膜是制造超薄芯片的关键步骤。成功的剥离过程需要同时满足以下条件:薄膜与晶片之间的界面脱粘,晶片与基底之间的界面保持未分层,晶片保持完好。然而,对这一剥离过程的基本机制的研究相对较少。本文建立了一个理论模型,以研究双层薄膜-基底系统中界面分层和晶片开裂的竞争行为。根据恒应力(Dugdale)内聚定律和欧拉-伯努利梁理论,确定了竞争性界面分层准则和晶片开裂准则。得到了相应的界面分层和晶片开裂竞争图,并据此预测了界面分层路径和晶片安全状态。系统研究了几个无量纲参数对界面分层和晶片开裂竞争行为的影响,包括双层薄膜-基底系统的几何特性、材料特性和界面特性。有限元分析(FEA)和实验结果对理论模型进行了验证。这项研究旨在为优化剥离参数提供一些指导,从而提高剥离过程的成功率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
6.70
自引率
8.30%
发文量
405
审稿时长
70 days
期刊介绍: The International Journal of Solids and Structures has as its objective the publication and dissemination of original research in Mechanics of Solids and Structures as a field of Applied Science and Engineering. It fosters thus the exchange of ideas among workers in different parts of the world and also among workers who emphasize different aspects of the foundations and applications of the field. Standing as it does at the cross-roads of Materials Science, Life Sciences, Mathematics, Physics and Engineering Design, the Mechanics of Solids and Structures is experiencing considerable growth as a result of recent technological advances. The Journal, by providing an international medium of communication, is encouraging this growth and is encompassing all aspects of the field from the more classical problems of structural analysis to mechanics of solids continually interacting with other media and including fracture, flow, wave propagation, heat transfer, thermal effects in solids, optimum design methods, model analysis, structural topology and numerical techniques. Interest extends to both inorganic and organic solids and structures.
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