Electrochemical mechanistic study of chlorpromazine oxidation in the presence of l-cysteine by digital simulation program: Introducing of EEC and EC'EC mechanisms
IF 8.3 2区 材料科学Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
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引用次数: 0
Abstract
New electrochemical mechanisms of chlorpromazine (CPZ) as one of the derivatives of phenothiazine and chlorpromazine in the presence of l-cysteine as an amino acid at 0.3 - 1.3 V on boron-doped diamond (BDD) electrode surface were studied using cyclic voltammetry (CV) technique for the first time. The results indicated that the electrochemical oxidation mechanism of chlorpromazine is EEC. Furthermore, the results of studying the electrochemical behavior of chlorpromazine in the presence of l-cysteine shows an electrocatalytic mechanism. According to these results, this system is implicated in the EC'EC mechanism. For both mechanisms, we studied the impact of increasing the concentration and rate of potential scanning. Digital simulation (Digital Simulation3 program) analyses were conducted using these mechanisms for cyclic voltammograms obtained on the boron-doped diamond electrode surface. Kinetic data were extracted from these voltammograms through digital simulations to estimate the heterogeneous rate constant (ks), equilibrium constant (Keq), charge-transfer coefficient (α), chemical rate constant (kc) and diffusion coefficient (D) by comparing the experimental responses with the simulated results.
期刊介绍:
ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.