Congyi Zhang , Xu He , Hao Sang , Hengzhou Yuan , Dawei Liu , Yang Guo
{"title":"A general and accurate pattern search method for various scenarios","authors":"Congyi Zhang , Xu He , Hao Sang , Hengzhou Yuan , Dawei Liu , Yang Guo","doi":"10.1016/j.vlsi.2024.102281","DOIUrl":null,"url":null,"abstract":"<div><p>As chip designs grow in complexity, the optical proximity correction (OPC) process becomes increasingly time-consuming. As a result, pattern search technology is becoming a foundation stone of many tasks for manufacturing, such as lithography simulation, hotspot detection, mask optimization, and so on. The most difficult challenge of pattern search is to locate clips by specific patterns within the layout accurately and efficiently. In this paper, we present a generalized pattern search method capable in diverse scenarios, including patterns with hollow shapes, shifting edges, and multi-layer situations. Experimental results show that our method outperforms commercial tools in pattern locating accuracy and handling search problems involving complex patterns which is not directly support by commercial tools yet.</p></div>","PeriodicalId":54973,"journal":{"name":"Integration-The Vlsi Journal","volume":null,"pages":null},"PeriodicalIF":2.2000,"publicationDate":"2024-09-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Integration-The Vlsi Journal","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0167926024001457","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"COMPUTER SCIENCE, HARDWARE & ARCHITECTURE","Score":null,"Total":0}
引用次数: 0
Abstract
As chip designs grow in complexity, the optical proximity correction (OPC) process becomes increasingly time-consuming. As a result, pattern search technology is becoming a foundation stone of many tasks for manufacturing, such as lithography simulation, hotspot detection, mask optimization, and so on. The most difficult challenge of pattern search is to locate clips by specific patterns within the layout accurately and efficiently. In this paper, we present a generalized pattern search method capable in diverse scenarios, including patterns with hollow shapes, shifting edges, and multi-layer situations. Experimental results show that our method outperforms commercial tools in pattern locating accuracy and handling search problems involving complex patterns which is not directly support by commercial tools yet.
期刊介绍:
Integration''s aim is to cover every aspect of the VLSI area, with an emphasis on cross-fertilization between various fields of science, and the design, verification, test and applications of integrated circuits and systems, as well as closely related topics in process and device technologies. Individual issues will feature peer-reviewed tutorials and articles as well as reviews of recent publications. The intended coverage of the journal can be assessed by examining the following (non-exclusive) list of topics:
Specification methods and languages; Analog/Digital Integrated Circuits and Systems; VLSI architectures; Algorithms, methods and tools for modeling, simulation, synthesis and verification of integrated circuits and systems of any complexity; Embedded systems; High-level synthesis for VLSI systems; Logic synthesis and finite automata; Testing, design-for-test and test generation algorithms; Physical design; Formal verification; Algorithms implemented in VLSI systems; Systems engineering; Heterogeneous systems.