Yuanbing Zhang;Hui Ma;Chen Yu;Chen Fu;Zhiyuan Liu;Yingsan Geng;Jianhua Wang
{"title":"Two-Dimensional Kinetic Simulation of the Post-Arc Plasma Dissipation Process of Vacuum Circuit Breaker Influenced by Transverse Magnetic Field","authors":"Yuanbing Zhang;Hui Ma;Chen Yu;Chen Fu;Zhiyuan Liu;Yingsan Geng;Jianhua Wang","doi":"10.1109/TASC.2024.3451333","DOIUrl":null,"url":null,"abstract":"In this paper, the influence of the transverse magnetic field (TMF) on the post-arc residual plasma dissipation process of vacuum circuit breaker (VCB) is investigated by simulation. A two-dimensional (2D) particle-in-cell (PIC)/ Monte-Carlo collisional (MCC) model of the post-arc plasma dissipation process is established. Firstly, the influences of the TMF on the plasma motion are analyzed. The results indicate that the TMF enhances the ion velocity, thereby facilitating the plasma dissipation. In addition, the model was improved by considering the particle collision process. It was found that the TMF increases collisions and produces more charged particles, which hinders plasma dissipation. Finally, as the TMF affects the movement and collisions of particles, the time for the plasma dissipation initially decreases, then rises as the TMF increases from 0 mT to 400 mT. The minimum dissipation time occurs at 100 mT, with Cu\n<sup>+</sup>\n taking 1.47 µs and electrons taking 1.14 µs. This work could help to improve the breaking ability of the VCB.","PeriodicalId":13104,"journal":{"name":"IEEE Transactions on Applied Superconductivity","volume":"34 8","pages":"1-5"},"PeriodicalIF":1.7000,"publicationDate":"2024-08-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Applied Superconductivity","FirstCategoryId":"101","ListUrlMain":"https://ieeexplore.ieee.org/document/10654505/","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
In this paper, the influence of the transverse magnetic field (TMF) on the post-arc residual plasma dissipation process of vacuum circuit breaker (VCB) is investigated by simulation. A two-dimensional (2D) particle-in-cell (PIC)/ Monte-Carlo collisional (MCC) model of the post-arc plasma dissipation process is established. Firstly, the influences of the TMF on the plasma motion are analyzed. The results indicate that the TMF enhances the ion velocity, thereby facilitating the plasma dissipation. In addition, the model was improved by considering the particle collision process. It was found that the TMF increases collisions and produces more charged particles, which hinders plasma dissipation. Finally, as the TMF affects the movement and collisions of particles, the time for the plasma dissipation initially decreases, then rises as the TMF increases from 0 mT to 400 mT. The minimum dissipation time occurs at 100 mT, with Cu
+
taking 1.47 µs and electrons taking 1.14 µs. This work could help to improve the breaking ability of the VCB.
期刊介绍:
IEEE Transactions on Applied Superconductivity (TAS) contains articles on the applications of superconductivity and other relevant technology. Electronic applications include analog and digital circuits employing thin films and active devices such as Josephson junctions. Large scale applications include magnets for power applications such as motors and generators, for magnetic resonance, for accelerators, and cable applications such as power transmission.