K. Derkaoui , I. Bencherifa , T. Hadjersi , I. Belkhettab , K. Boukhouidem , S. Bouanik , A. Brik , M. Kechouane , M.M. Kaci
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引用次数: 0
Abstract
Pollution triggered by organic dyes is a prominent global concern. Thus, it is imperative to devise an effective preventative strategy to tackle this matter. Herein, using the chemical electroless deposition process, a novel SiNWs/MnO2 photocatalyst was successfully manufactured for efficacious photocatalytic purification under visible lighting. Through a series of characterization techniques, the structural, morphological, compositional, and optical features of MnO2-deposited silicon nanowires were thoroughly investigated. The photocatalytic ability of the resultant sample was reckoned by degrading Rhodamine B upon visible exposure. Following 180 min of brightness, the findings found that SiNWs/MnO2 displayed remarkable effectiveness, with a lessening of 93.4 %. The findings demonstrated a significant enhancement in degradation performance linked to the rising surface area and enhanced electron-hole segregation efficiency provided by silicon nanowires. Also, the sample's recyclability was assessed, exhibiting an encouraging sustainability with a slight fall in effectiveness (∼10%) after 6 straight utilizes. Furthermore, scavenging tests have shown that •OH and •O2− were prevalent species accountable for the RhB degradation reaction. Eventually, founded on the results, a plausible mechanism for RhB decomposition was suggested. Altogether, given the straightforward manufacturing method and impressive performance, the study argues that the novel SiNWs/MnO2 might be an intriguing photocatalyst for water contaminant remediation.
期刊介绍:
ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.