Dominant Scattering Mechanisms in Limiting the Electron Mobility of Scandium Nitride.

Abstract

Electron mobility in nitride semiconductors is limited by electron-phonon, defect, grain-boundary, and dislocation scatterings. Scandium nitride (ScN), an emerging rocksalt indirect bandgap semiconductor, exhibits varying electron mobilities depending on growth conditions. Since achieving high mobility is crucial for ScN's device applications, a microscopic understanding of different scattering mechanisms is extremely important. Utilizing the ab initio Boltzmann transport formalism and experimental measurements, here we show the hierarchy of various scattering processes in restricting the electron mobility of ScN. Calculations unveil that though Fröhlich interactions set an intrinsic upper bound for ScN's electron mobility of ∼524 cm²/V·s at room temperature, ionized-impurity and grain-boundary scatterings significantly reduce mobility. The experimental temperature dependence of mobilities is captured well considering both nitrogen-vacancy and oxygen-substitutional impurities with appropriate ratios, and room-temperature doping dependency agrees well with the empirical Caughey-Thomas model. Furthermore, we suggest modulation doping and polar-discontinuity doping to reduce ionized-impurity scattering in achieving a high-mobility ScN for device applications.