A tutorial on the micro-trench technique for incident ion angle, material erosion, and impurity deposition measurements at plasma-facing surfaces

IF 1.4 3区 物理与天体物理 Q3 INSTRUMENTS & INSTRUMENTATION
S. Abe , C.H Skinner , B.E. Koel
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Abstract

The micro-trench method is a new technique to measure polar and azimuthal incident ion angles, material erosion, and impurity deposition at plasma-facing surfaces, and has been applied in the DIII-D divertor. This article gives a tutorial of the micro-trench technique consisting of six steps: (1) micro-trench fabrication, (2) pre-exposure measurement of the fabricated micro-trench geometry, (3) tracer material deposition, (4) plasma exposure, (5) post-exposure observation of the tracer material, and (6) post-exposure measurement of the micro-trench geometry. Two criteria need to be satisfied to apply the micro-trench method successfully: (i) uniform impurity deposition on the micro-trench floor, and (ii) erosion dominated by the physical sputtering induced by the impinging ions. When those two criteria are satisfied, post-exposure analysis of the impurity deposition patterns on the micro-trench floor may be used to determine the polar and azimuthal incident ion directions (mean values of the ion angle directions), erosion rate, and impurity deposition rate during plasma exposure without computational interpretation.

入射离子角、材料侵蚀和等离子表面杂质沉积测量的微沟槽技术教程
微沟槽法是一种测量离子极角和方位角、材料侵蚀和等离子体表面杂质沉积的新技术,已应用于 DIII-D 分流器。本文介绍了由六个步骤组成的微沟槽技术:(1) 制作微沟槽;(2) 对制作的微沟槽几何形状进行曝光前测量;(3) 沉积示踪材料;(4) 等离子体曝光;(5) 示踪材料曝光后观察;(6) 微沟槽几何形状曝光后测量。成功应用微沟槽方法需要满足两个条件:(i) 微沟槽底部杂质沉积均匀;(ii) 由离子冲击引起的物理溅射侵蚀占主导地位。在满足这两个条件的情况下,对微沟底杂质沉积模式的暴露后分析可用于确定等离子体暴露期间的极性和方位入射离子方向(离子角度方向的平均值)、侵蚀率和杂质沉积率,而无需进行计算解释。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
2.80
自引率
7.70%
发文量
231
审稿时长
1.9 months
期刊介绍: Section B of Nuclear Instruments and Methods in Physics Research covers all aspects of the interaction of energetic beams with atoms, molecules and aggregate forms of matter. This includes ion beam analysis and ion beam modification of materials as well as basic data of importance for these studies. Topics of general interest include: atomic collisions in solids, particle channelling, all aspects of collision cascades, the modification of materials by energetic beams, ion implantation, irradiation - induced changes in materials, the physics and chemistry of beam interactions and the analysis of materials by all forms of energetic radiation. Modification by ion, laser and electron beams for the study of electronic materials, metals, ceramics, insulators, polymers and other important and new materials systems are included. Related studies, such as the application of ion beam analysis to biological, archaeological and geological samples as well as applications to solve problems in planetary science are also welcome. Energetic beams of interest include atomic and molecular ions, neutrons, positrons and muons, plasmas directed at surfaces, electron and photon beams, including laser treated surfaces and studies of solids by photon radiation from rotating anodes, synchrotrons, etc. In addition, the interaction between various forms of radiation and radiation-induced deposition processes are relevant.
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