Comparing single-shot damage thresholds of boron carbide and silicon at the European XFEL.

IF 2.5 3区 物理与天体物理
Journal of Synchrotron Radiation Pub Date : 2024-09-01 Epub Date: 2024-08-25 DOI:10.1107/S1600577524007318
Marziyeh Tavakkoly, Jaromir Chalupsky, Vera Hajkova, Wolfgang Hillert, Simon Jelinek, Libor Juha, Mikako Makita, Tommaso Mazza, Michael Meyer, Jacobo Montano, Harald Sinn, Vojtech Vozda, Maurizio Vannoni
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引用次数: 0

Abstract

Xray free-electron lasers (XFELs) enable experiments that would have been impractical or impossible at conventional X-ray laser facilities. Indeed, more XFEL facilities are being built and planned, with their aim to deliver larger pulse energies and higher peak brilliance. While seeking to increase the pulse power, it is quintessential to consider the maximum pulse fluence that a grazing-incidence FEL mirror can withstand. To address this issue, several studies were conducted on grazing-incidence damage by soft X-ray FEL pulses at the European XFEL facility. Boron carbide (B4C) coatings on polished silicon substrate were investigated using 1 keV photon energy, similar to the X-ray mirrors currently installed at the soft X-ray beamlines (SASE3). The purpose of this study is to compare the damage threshold of B4C and Si to determine the advantages, tolerance and limits of using B4C coatings.

在欧洲 XFEL 上比较碳化硼和硅的单次损伤阈值。
X 射线自由电子激光器(XFEL)使传统 X 射线激光设备不切实际或无法进行的实验成为可能。事实上,更多的 XFEL 设备正在建设和规划中,其目标是提供更大的脉冲能量和更高的峰值亮度。在寻求提高脉冲功率的同时,必须考虑掠入射 FEL 镜所能承受的最大脉冲流量。为了解决这个问题,欧洲 XFEL 设备对软 X 射线 FEL 脉冲造成的掠入射损伤进行了多项研究。使用 1 keV 光子能量对抛光硅基板上的碳化硼 (B4C) 涂层进行了研究,这与目前安装在软 X 射线光束线 (SASE3) 上的 X 射线反射镜类似。这项研究的目的是比较 B4C 和硅的损伤阈值,以确定使用 B4C 涂层的优势、容限和极限。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Journal of Synchrotron Radiation
Journal of Synchrotron Radiation INSTRUMENTS & INSTRUMENTATIONOPTICS&-OPTICS
CiteScore
5.60
自引率
12.00%
发文量
289
审稿时长
1 months
期刊介绍: Synchrotron radiation research is rapidly expanding with many new sources of radiation being created globally. Synchrotron radiation plays a leading role in pure science and in emerging technologies. The Journal of Synchrotron Radiation provides comprehensive coverage of the entire field of synchrotron radiation and free-electron laser research including instrumentation, theory, computing and scientific applications in areas such as biology, nanoscience and materials science. Rapid publication ensures an up-to-date information resource for scientists and engineers in the field.
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