Record 35% Power-Added Efficiency at 170 GHz in 300-nm InP/GaAsSb DHBTs

0 ENGINEERING, ELECTRICAL & ELECTRONIC
Sara Hamzeloui;Akshay M. Arabhavi;Filippo Ciabattini;Giorgio Bonomo;Mojtaba Ebrahimi;Rimjhim Chaudhary;Markus Müller;Olivier Ostinelli;Michael Schröter;Colombo R. Bolognesi
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Abstract

We report the 170-GHz power performance of multifinger common-emitter (CE) 300-nm indium phosphide (InP)/GaAsSb double heterojunction bipolar transistors (DHBTs). Devices with one-, two-, and four-finger(s) with 7.5-, 10-, or 12.5- $\mu $ m-long emitter fingers were simultaneously fabricated. A record power-added efficiency PAE =35% is measured for single-finger 7.5- $\mu $ m-long DHBTs with a saturated matched output power $P_{\mathrm {OUT,SAT}} =9.5$ dBm. A $P_{\mathrm {OUT,SAT}} \gt 12$ and >14.5 dBm with peak PAE =25% and 22% is delivered from two- and four-finger 10- $\mu $ m-long DHBTs, respectively. To the best of our knowledge, 35% is the highest PAE reported for any PA/PA cell in any transistor technology over the entire G-band range. We attribute the high efficiency achieved in this study to the exceptionally high gain transistors in the (sub)-millimeter-wave (mm-wave) range, as well as the advantageous combination of high breakdown and low knee voltages. This work details the first G-band power characterization of single- and multi-finger GaAsSb-based DHBTs—it is also the first such study in any InP DHBT. An all-technology record Class-A G-band PAE is achieved with a minimal reduction with respect to W-band peak PAE levels. An HICUM-based large-signal model verifies the mm-wave RF measurements.
300 纳米 InP/GaAsSb DHBT 在 170 GHz 的功率附加效率达到创纪录的 35
我们报告了多指共发射极(CE)300 纳米磷化铟(InP)/砷化镓(GaAs)双异质结双极晶体管(DHBT)的 170-GHz 功率性能。我们同时制造出了具有 7.5、10 或 12.5 英寸长发射极指的单指、双指和四指器件。在饱和匹配输出功率 $P_{\mathrm {OUT,SAT}} =9.5 $ dBm 的情况下,单指 7.5 $\mu $ m 长 DHBT 测得创纪录的功率附加效率 PAE =35%。P_{\mathrm {OUT,SAT}} =9.5$ dBm。\gt 12$ 和 >14.5 dBm,峰值 PAE =25% 和 22%,分别由两指和四指 10- $\mu $ m 长的 DHBT 提供。据我们所知,在整个 G 波段范围内,35% 是任何晶体管技术的 PA/PA 单元所报告的最高 PAE。我们将这项研究中实现的高效率归功于(亚)毫米波(mm-wave)范围内的超高增益晶体管,以及高击穿电压和低膝部电压的优势组合。这项工作详细介绍了基于砷化镓锑的单指和多指 DHBT 的首次 G 波段功率特性分析,这也是对任何 InP DHBT 的首次此类研究。与 W 波段峰值 PAE 水平相比,G 波段 PAE 降低到了最低水平,创下了所有技术中的最高纪录。基于 HICUM 的大信号模型验证了毫米波射频测量结果。
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