Modeling and Design of GeSn Avalanche Photodiodes With High Tin Content for Applications at 3.3 μm

IF 4.3 2区 工程技术 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC
Lorenzo Finazzi;Raffaele Giani;Omar Concepción;Dan Buca;Vincent Reboud;Giovanni Isella;Alberto Tosi
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Abstract

We propose and compare two back-side illuminated GeSn avalanche photodiode (APD) mesa structures with 15% tin content operating at photon wavelengths up to 3.3 μm, suitable for applications like methane gas sensing and analysis of tampered olive oil. The two structures have different multiplication materials: a) silicon, which requires an additional Ge Strain-Relaxed Buffer (SRB) layer for high-quality GeSn growth; b) germanium, which is acting also as SRB layer. The latter design is innovative compared to the state-of-the-art and it proposed to: i) reduce the space charge region (SCR) width by avoiding a too thick Ge SRB, which is required for growing high-tin-content GeSn; ii) avoid one supplementary non-lattice matched heterojunction in the SCR. Physical models for GeSn are discussed for the most relevant parameters of APD design. Simulations are performed in the electrical and optical domains, for evaluating the main figures of merit of APDs and comparing the expected performances between the two designs. Finally, we present the modeling and design of a focalizing all-dielectric metalens, integrated on the detector back-side, for improving the photon collection efficiency at the same active volume size, thus improving the signal-to-noise ratio.
用于 3.3 μm 波长的高锡含量 GeSn 雪崩光电二极管的建模与设计
我们提出并比较了两种背照式 GeSn 雪崩光电二极管 (APD) 中子结构,其锡含量为 15%,工作光子波长高达 3.3 μm,适用于甲烷气体传感和篡改橄榄油分析等应用。这两种结构采用了不同的倍增材料:a) 硅,需要额外的 Ge 应变衰减缓冲器(SRB)层,以实现高质量的 GeSn 生长;b) 锗,也用作 SRB 层。与最先进的设计相比,后一种设计具有创新性,它建议:i) 通过避免过厚的 Ge SRB(生长高锡含量的 GeSn 所必需的)来减小空间电荷区(SCR)的宽度;ii) 避免在 SCR 中出现一个补充的非晶格匹配异质结。针对 APD 设计中最相关的参数,讨论了 GeSn 的物理模型。在电学和光学领域进行了仿真,以评估 APD 的主要优点,并比较两种设计的预期性能。最后,我们介绍了集成在探测器背面的聚焦全介质金属膜的建模和设计,以便在相同的有源体积尺寸下提高光子收集效率,从而改善信噪比。
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来源期刊
IEEE Journal of Selected Topics in Quantum Electronics
IEEE Journal of Selected Topics in Quantum Electronics 工程技术-工程:电子与电气
CiteScore
10.60
自引率
2.00%
发文量
212
审稿时长
3 months
期刊介绍: Papers published in the IEEE Journal of Selected Topics in Quantum Electronics fall within the broad field of science and technology of quantum electronics of a device, subsystem, or system-oriented nature. Each issue is devoted to a specific topic within this broad spectrum. Announcements of the topical areas planned for future issues, along with deadlines for receipt of manuscripts, are published in this Journal and in the IEEE Journal of Quantum Electronics. Generally, the scope of manuscripts appropriate to this Journal is the same as that for the IEEE Journal of Quantum Electronics. Manuscripts are published that report original theoretical and/or experimental research results that advance the scientific and technological base of quantum electronics devices, systems, or applications. The Journal is dedicated toward publishing research results that advance the state of the art or add to the understanding of the generation, amplification, modulation, detection, waveguiding, or propagation characteristics of coherent electromagnetic radiation having sub-millimeter and shorter wavelengths. In order to be suitable for publication in this Journal, the content of manuscripts concerned with subject-related research must have a potential impact on advancing the technological base of quantum electronic devices, systems, and/or applications. Potential authors of subject-related research have the responsibility of pointing out this potential impact. System-oriented manuscripts must be concerned with systems that perform a function previously unavailable or that outperform previously established systems that did not use quantum electronic components or concepts. Tutorial and review papers are by invitation only.
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