Theoretical investigation on the influence of H2 ${{\rm{H}}}_{2}$ additions on the He + 1% O2 ${{\rm{O}}}_{2}$ plasma reactivity for water treatment applications
Osama A. Shabaek, Mohammad A. Kher‐Elden, Zakaria M. Abd El‐Fattah, Farouk F. Elakshar, Osama Yassin
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引用次数: 0
Abstract
Plasma‐based technologies offer environmentally friendly means of effective water purification. Here, we present a discharge system with He + 1% . Tunable amounts of were introduced to control the yield of reactive species. Detailed exploration of the system provides a deeper understanding of some of the fundamental chemical kinetics related to plasma‐based wastewater treatment. A global model was used to investigate the effect of additions on the yield of some important reactive species for advanced oxidation treatment of wastewater. Humidity leakage was considered to simulate the effect of humidified environments. The pathway analysis module provides deeper insight into chemical kinetics. It was concluded that additives can be used in tailoring plasma yield for water treatment applications.
关于 H2 ${{\rm{H}}}_{2}$ 添加量对用于水处理的 He + 1% O2 ${{\rm{O}}}_{2}$ 等离子体反应性影响的理论研究
基于等离子体的技术为有效净化水提供了环保手段。在这里,我们介绍了一种 He + 1% 的放电系统。我们引入了可调量的氦气来控制反应物的产量。通过对该系统的详细探索,我们可以更深入地了解与基于等离子体的废水处理相关的一些基本化学动力学。我们使用了一个全局模型来研究添加物对一些重要反应物产量的影响,这些反应物可用于废水的高级氧化处理。考虑了湿度泄漏,以模拟潮湿环境的影响。路径分析模块对化学动力学有更深入的了解。结论是,添加剂可用于调整水处理应用中的等离子产率。
期刊介绍:
Plasma Processes & Polymers focuses on the interdisciplinary field of low temperature plasma science, covering both experimental and theoretical aspects of fundamental and applied research in materials science, physics, chemistry and engineering in the area of plasma sources and plasma-based treatments.