Microreactor assisted soft lithography of nanostructured antimony sulfide thin film patterns: nucleation, growth and application in solid state batteries†
Bryan Chun, V. Vinay K. Doddapaneni, Marcos Lucero, Changqing Pan, Zhongwei Gao, Zhenxing Feng, Rajiv Malhotra and Chih-hung Chang
{"title":"Microreactor assisted soft lithography of nanostructured antimony sulfide thin film patterns: nucleation, growth and application in solid state batteries†","authors":"Bryan Chun, V. Vinay K. Doddapaneni, Marcos Lucero, Changqing Pan, Zhongwei Gao, Zhenxing Feng, Rajiv Malhotra and Chih-hung Chang","doi":"10.1039/D4YA00436A","DOIUrl":null,"url":null,"abstract":"<p >This study explores the microreactor-assisted soft lithography (MASL) method for direct, one-step synthesis and patterning of additive-free antimony sulfide (Sb<small><sub>2</sub></small>S<small><sub>3</sub></small>) nanostructured thin films. The results reveal the steady state process and its ability to overcome the challenges and limitations of conventional solution deposition processes. This new approach, exploiting continuous flow, prevents the dissolution of the growing film, a common issue in batch solution deposition methods. Furthermore, this study successfully fabricates functional Sb<small><sub>2</sub></small>S<small><sub>3</sub></small>–Li coin cell prototypes, demonstrating stable specific capacities of 600 mA h g<small><sup>−1</sup></small> for over 260 cycles at a C/2 charge rate and coulombic efficiencies of 96–98%.</p>","PeriodicalId":72913,"journal":{"name":"Energy advances","volume":" 9","pages":" 2200-2211"},"PeriodicalIF":3.2000,"publicationDate":"2024-08-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2024/ya/d4ya00436a?page=search","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Energy advances","FirstCategoryId":"1085","ListUrlMain":"https://pubs.rsc.org/en/content/articlelanding/2024/ya/d4ya00436a","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 0
Abstract
This study explores the microreactor-assisted soft lithography (MASL) method for direct, one-step synthesis and patterning of additive-free antimony sulfide (Sb2S3) nanostructured thin films. The results reveal the steady state process and its ability to overcome the challenges and limitations of conventional solution deposition processes. This new approach, exploiting continuous flow, prevents the dissolution of the growing film, a common issue in batch solution deposition methods. Furthermore, this study successfully fabricates functional Sb2S3–Li coin cell prototypes, demonstrating stable specific capacities of 600 mA h g−1 for over 260 cycles at a C/2 charge rate and coulombic efficiencies of 96–98%.