Microreactor assisted soft lithography of nanostructured antimony sulfide thin film patterns: nucleation, growth and application in solid state batteries†

IF 3.2 Q2 CHEMISTRY, PHYSICAL
Energy advances Pub Date : 2024-08-12 DOI:10.1039/D4YA00436A
Bryan Chun, V. Vinay K. Doddapaneni, Marcos Lucero, Changqing Pan, Zhongwei Gao, Zhenxing Feng, Rajiv Malhotra and Chih-hung Chang
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引用次数: 0

Abstract

This study explores the microreactor-assisted soft lithography (MASL) method for direct, one-step synthesis and patterning of additive-free antimony sulfide (Sb2S3) nanostructured thin films. The results reveal the steady state process and its ability to overcome the challenges and limitations of conventional solution deposition processes. This new approach, exploiting continuous flow, prevents the dissolution of the growing film, a common issue in batch solution deposition methods. Furthermore, this study successfully fabricates functional Sb2S3–Li coin cell prototypes, demonstrating stable specific capacities of 600 mA h g−1 for over 260 cycles at a C/2 charge rate and coulombic efficiencies of 96–98%.

Abstract Image

纳米结构硫化锑薄膜图案的微反应器辅助软光刻:固态电池中的成核、生长和应用
本研究探索了微反应器辅助软光刻(MASL)方法,用于一步法直接合成无添加剂硫化锑(Sb2S3)纳米结构薄膜并将其图案化。研究结果揭示了稳态工艺及其克服传统溶液沉积工艺的挑战和局限性的能力。这种利用连续流的新方法可以防止生长薄膜的溶解,而这是批量溶液沉积方法中常见的问题。此外,这项研究还成功制造出了功能性 Sb2S3-Li 纽扣电池原型,在 C/2 充电速率下超过 260 个循环中显示出 600 mAh g-1 的稳定比容量和 96-98% 的库仑效率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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CiteScore
1.80
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