Activation Energy of DC Hopping Conductivity of Lightly Doped Weakly Compensated Crystalline Semiconductors

N. Poklonski, I. I. Anikeev, S. A. Vyrko, A. Zabrodskii
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Abstract

A model is proposed for calculating the thermal activation energy of direct current hopping conductivity via nearest neighbors in lightly doped and weakly compensated crystalline semiconductors with hydrogen‐like impurities. The temperature region is considered in which hops of single holes occur only between acceptors randomly distributed over the crystal (or hops of single electrons only between donors). The model is based on the idea of the Coulomb blockade of charge carriers by the field of compensating impurities (trap impurities). The hopping length of a hole between acceptors (or an electron between donors) is assumed to be equal to the critical (percolation) radius of the spherical region per a majority (doping) impurity atom. At a critical radius, an infinite cluster connecting ohmic contacts is formed in the crystal, along which charge carriers move in a hopping manner via majority impurities. The value of is defined as average work on overcoming the electrostatic Coulomb blockade by a charge carrier and its hopping via the electrically conducting cluster to “infinity”. The results of calculating by the proposed model of the Coulomb blockade for the most well‐studied bulk germanium and silicon p‐ and n‐type crystals are consistent with known experimental data.
轻掺杂弱补偿晶体半导体直流跳变电导的活化能
本文提出了一个模型,用于计算在含有氢类杂质的轻掺杂和弱补偿晶体半导体中通过近邻发生直流跳变导电的热活化能。所考虑的温度区域是:单个空穴的跳变只发生在晶体上随机分布的受体之间(或单个电子的跳变只发生在供体之间)。该模型基于电荷载流子被补偿杂质场(陷阱杂质)库仑阻断的思想。空穴在受体之间(或电子在供体之间)的跳跃长度被假定为等于球形区域中每个多数(掺杂)杂质原子的临界(渗流)半径。在临界半径处,晶体中会形成一个连接欧姆接触的无限簇,电荷载流子通过多数杂质以跳跃的方式沿该簇移动。的值被定义为电荷载流子克服静电库仑阻滞并通过导电簇跳跃到 "无穷大 "的平均功。根据提出的库仑阻滞模型对研究最深入的块状锗和硅 p 型和 n 型晶体进行计算的结果与已知的实验数据一致。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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