Structural, Physical, and Optical Characteristics and γ-Ray Protection Efficacy of Fluoroboro-Tellurite Glasses Reinforced with La3+ Ions

IF 2.2 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Norah A. M. Alsaif, Nada Alfryyan, Hanan Al-Ghamdi, S. M. Kotb, S. Talaat, A. M. Abdelghany, Yasser S. Rammah, A. S. Abouhaswa, M. S. Sadeq
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引用次数: 0

Abstract

Fluoroboro tellurite glasses containing La2O3 with nominal composition of 43B2O3 + 33TeO2 + (12−x)BaF2 + 12Na2O + xLa2O3 x = 0 (La0.0), 0.5 (La0.5), 1 (La1.0), 2 (La2.0), and 3 (La3.0) mol% were fabricated using the melt quenching technique. The effects of La3+ ion content inclusion in the prepared glass matrices, including the structural, physical, and optical properties and γ-ray protection efficacy, were then explored. The amorphous state of the La-glasses was verified by the broad and diffuse dispersion of all XRD patterns at low angles. As La2O3 additives were added from 0 to 3 mol%, the density (ρ) increased from 3.6243 g/cm3 to3.8743 g/cm3 and the molar volume (Vm) decreased from 30.6488 cm3/mol to 29.8364 cm3/mol. Lanthanum ion concentrations (NLa) increased from 0 for La0.0 glasses to 312.1103 × 1020 cm−3 for La3.0 glasses. The polar radius decreased from 0 Å to 3.7813 Å, whereas the ligand field strength between La ions and their surroundings increased from 0 Å−2 to 18.1839 Å−2. Values of optical gap (Eg) varied from 3.07 eV to 2.82 eV. The values of linear refractive index (n0) varied from 2.383 to 2.443, whereas values of nonlinear refractive index (n2) changed from 5.16 × 10−11 esu to 6.40 × 10−11 esu for La0.0 and La3.0 glass specimens. Mass (MAC) and linear (LAC) attenuation coefficients were lowest in La0.0 glasses and highest in La3.0 glasses. The trend of the mean free path (MFP) of La-glasses was inverse to that of the LAC and MAC. The order of the MFP trend, which indicates the influence of La2O3 in the glass matrix, was typically (MFP)La0.0 > (MFP)La0.5 > (MFP)La1.0 > (MFP)La2.0 > (MFP)La3.0. Results show that the recommended glasses appear to be promising materials for various optical devices and radiation protection applications.

Abstract Image

用 La3+ 离子强化的氟硼碲玻璃的结构、物理和光学特性及 γ 射线防护效能
利用熔体淬火技术制造了含有 La2O3 的氟硼碲玻璃,其标称成分为 43B2O3 + 33TeO2 + (12-x)BaF2 + 12Na2O + xLa2O3 x = 0 (La0.0)、0.5 (La0.5)、1 (La1.0)、2 (La2.0) 和 3 (La3.0) mol%。然后探讨了在制备的玻璃基质中加入 La3+ 离子的影响,包括结构、物理和光学特性以及γ射线防护功效。在低角度下,所有 XRD 图样都呈宽广弥散状,从而验证了 La 玻璃的无定形状态。随着 La2O3 添加剂的添加量从 0 摩尔/立方厘米增加到 3 摩尔/立方厘米,密度(ρ)从 3.6243 克/立方厘米增加到 3.8743 克/立方厘米,摩尔体积(Vm)从 30.6488 立方厘米/摩尔减少到 29.8364 立方厘米/摩尔。镧离子浓度(NLa)从 La0.0 玻璃的 0 增加到 La3.0 玻璃的 312.1103 × 1020 cm-3。极性半径从 0 Å 减小到 3.7813 Å,而 La 离子与其周围环境之间的配位体场强度从 0 Å-2 增加到 18.1839 Å-2。光隙(Eg)值从 3.07 eV 到 2.82 eV 不等。La0.0 和 La3.0 玻璃试样的线性折射率 (n0) 值从 2.383 到 2.443 不等,而非线性折射率 (n2) 值则从 5.16 × 10-11 esu 到 6.40 × 10-11 esu 不等。质量(MAC)和线性(LAC)衰减系数在 La0.0 玻璃中最低,在 La3.0 玻璃中最高。La 玻璃的平均自由路径(MFP)趋势与 LAC 和 MAC 的趋势相反。平均自由路径趋势的顺序通常是(MFP)La0.0 > (MFP)La0.5 > (MFP)La1.0 > (MFP)La2.0 > (MFP)La3.0。结果表明,所推荐的玻璃似乎有望成为各种光学设备和辐射防护应用的材料。
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来源期刊
Journal of Electronic Materials
Journal of Electronic Materials 工程技术-材料科学:综合
CiteScore
4.10
自引率
4.80%
发文量
693
审稿时长
3.8 months
期刊介绍: The Journal of Electronic Materials (JEM) reports monthly on the science and technology of electronic materials, while examining new applications for semiconductors, magnetic alloys, dielectrics, nanoscale materials, and photonic materials. The journal welcomes articles on methods for preparing and evaluating the chemical, physical, electronic, and optical properties of these materials. Specific areas of interest are materials for state-of-the-art transistors, nanotechnology, electronic packaging, detectors, emitters, metallization, superconductivity, and energy applications. Review papers on current topics enable individuals in the field of electronics to keep abreast of activities in areas peripheral to their own. JEM also selects papers from conferences such as the Electronic Materials Conference, the U.S. Workshop on the Physics and Chemistry of II-VI Materials, and the International Conference on Thermoelectrics. It benefits both specialists and non-specialists in the electronic materials field. A journal of The Minerals, Metals & Materials Society.
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