Nitrogen, oxygen, and hydrogen bonding and thermal stability of ambient exposed nitrogen-terminated H-diamond (111) surfaces studied by XPS and HREELS

IF 2.1 4区 化学 Q3 CHEMISTRY, PHYSICAL
{"title":"Nitrogen, oxygen, and hydrogen bonding and thermal stability of ambient exposed nitrogen-terminated H-diamond (111) surfaces studied by XPS and HREELS","authors":"","doi":"10.1016/j.susc.2024.122555","DOIUrl":null,"url":null,"abstract":"<div><p>We report on the chemical composition, bonding, and in-vacuum thermal stability (up to 1000 °C) of nitrogen plasma terminated H-Diamond(111) (H-Di(111)) surfaces followed by ambient exposure. The nitrogen-plasma exposures include radio frequency (RF) (at pressure: 3 × 10<sup>−2</sup> (damaging) and 7 × 10<sup>−2</sup> Torr (non-damaging)) and microwave (MW) nitrogen plasmas and studied by X-ray photoelectron spectroscopy (XPS) and high resolution electron energy loss spectroscopy (HREELS). The largest nitrogen intake was observed upon exposure to RF(N<sub>2</sub>) damaging plasma, followed by MW(N<sub>2</sub>) and non-damaging RF(N<sub>2</sub>) plasmas. A similar trend follows the adsorption of adventitious oxygen. The XPS analysis shows that most of the adventitious oxygen is adsorbed in a CO<sub>x</sub> configuration upon nitride surfaces exposure to ambient conditions. However, upon high temperature annealing of the damaging RF(N<sub>2</sub>) plasma exposed surface, some NO<sub>x</sub> (species) were detected by XPS. From the HREELS analysis, the hydrogen adsorbed on the H-Di(111) is not fully removed by exposure to the different nitrogen plasmas. These measurements show that NH(ads) species are formed on the surface and are desorbed upon vacuum annealing in the 500–700 °C range. This study may be of importance in all ex-situ applications influenced by the near-surface physicochemical and electronic properties of nitrogen-terminated H-Di(111) surfaces.</p></div>","PeriodicalId":22100,"journal":{"name":"Surface Science","volume":null,"pages":null},"PeriodicalIF":2.1000,"publicationDate":"2024-07-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface Science","FirstCategoryId":"92","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0039602824001067","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
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Abstract

We report on the chemical composition, bonding, and in-vacuum thermal stability (up to 1000 °C) of nitrogen plasma terminated H-Diamond(111) (H-Di(111)) surfaces followed by ambient exposure. The nitrogen-plasma exposures include radio frequency (RF) (at pressure: 3 × 10−2 (damaging) and 7 × 10−2 Torr (non-damaging)) and microwave (MW) nitrogen plasmas and studied by X-ray photoelectron spectroscopy (XPS) and high resolution electron energy loss spectroscopy (HREELS). The largest nitrogen intake was observed upon exposure to RF(N2) damaging plasma, followed by MW(N2) and non-damaging RF(N2) plasmas. A similar trend follows the adsorption of adventitious oxygen. The XPS analysis shows that most of the adventitious oxygen is adsorbed in a COx configuration upon nitride surfaces exposure to ambient conditions. However, upon high temperature annealing of the damaging RF(N2) plasma exposed surface, some NOx (species) were detected by XPS. From the HREELS analysis, the hydrogen adsorbed on the H-Di(111) is not fully removed by exposure to the different nitrogen plasmas. These measurements show that NH(ads) species are formed on the surface and are desorbed upon vacuum annealing in the 500–700 °C range. This study may be of importance in all ex-situ applications influenced by the near-surface physicochemical and electronic properties of nitrogen-terminated H-Di(111) surfaces.

Abstract Image

利用 XPS 和 HREELS 研究氮、氧和氢键以及环境暴露氮端 H-金刚石 (111) 表面的热稳定性
我们报告了氮等离子体终止 H-Diamond(111)(H-Di(111))表面的化学成分、键合和真空热稳定性(高达 1000 °C),然后进行环境暴露。氮等离子体暴露包括射频(RF)(压力:3 × 10-2(破坏性)和 7 × 10-2 托(非破坏性))和微波(MW)氮等离子体,并通过 X 射线光电子能谱(XPS)和高分辨率电子能量损失能谱(HREELS)进行研究。在暴露于射频(N2)破坏性等离子体时观察到最大的氮摄入量,其次是微波(N2)和非破坏性射频(N2)等离子体。在吸附不定氧时也有类似的趋势。XPS 分析表明,氮化物表面暴露在环境条件下时,大部分不定氧以 COx 构型被吸附。然而,在破坏性射频(N2)等离子体暴露表面进行高温退火后,XPS 检测到了一些氮氧化物(物种)。从 HREELS 分析来看,H-Di(111) 上吸附的氢并没有因为暴露在不同的氮等离子体中而完全去除。这些测量结果表明,NH(吸附)物种在表面形成,并在 500-700 °C 真空退火后解吸。这项研究可能对所有受氮封端 H-Di(111)表面近表面物理化学和电子特性影响的原位应用具有重要意义。
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来源期刊
Surface Science
Surface Science 化学-物理:凝聚态物理
CiteScore
3.30
自引率
5.30%
发文量
137
审稿时长
25 days
期刊介绍: Surface Science is devoted to elucidating the fundamental aspects of chemistry and physics occurring at a wide range of surfaces and interfaces and to disseminating this knowledge fast. The journal welcomes a broad spectrum of topics, including but not limited to: • model systems (e.g. in Ultra High Vacuum) under well-controlled reactive conditions • nanoscale science and engineering, including manipulation of matter at the atomic/molecular scale and assembly phenomena • reactivity of surfaces as related to various applied areas including heterogeneous catalysis, chemistry at electrified interfaces, and semiconductors functionalization • phenomena at interfaces relevant to energy storage and conversion, and fuels production and utilization • surface reactivity for environmental protection and pollution remediation • interactions at surfaces of soft matter, including polymers and biomaterials. Both experimental and theoretical work, including modeling, is within the scope of the journal. Work published in Surface Science reaches a wide readership, from chemistry and physics to biology and materials science and engineering, providing an excellent forum for cross-fertilization of ideas and broad dissemination of scientific discoveries.
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