Nitrogen, oxygen, and hydrogen bonding and thermal stability of ambient exposed nitrogen-terminated H-diamond (111) surfaces studied by XPS and HREELS

IF 2.1 4区化学 Q3 CHEMISTRY, PHYSICAL

Surface Science Pub Date : 2024-07-20 DOI:10.1016/j.susc.2024.122555

Mohan Kumar Kuntumalla, Shaul Michaelson, Alon Hoffman

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Abstract

We report on the chemical composition, bonding, and in-vacuum thermal stability (up to 1000 °C) of nitrogen plasma terminated H-Diamond(111) (H-Di(111)) surfaces followed by ambient exposure. The nitrogen-plasma exposures include radio frequency (RF) (at pressure: 3 × 10⁻² (damaging) and 7 × 10⁻² Torr (non-damaging)) and microwave (MW) nitrogen plasmas and studied by X-ray photoelectron spectroscopy (XPS) and high resolution electron energy loss spectroscopy (HREELS). The largest nitrogen intake was observed upon exposure to RF(N₂) damaging plasma, followed by MW(N₂) and non-damaging RF(N₂) plasmas. A similar trend follows the adsorption of adventitious oxygen. The XPS analysis shows that most of the adventitious oxygen is adsorbed in a CO_x configuration upon nitride surfaces exposure to ambient conditions. However, upon high temperature annealing of the damaging RF(N₂) plasma exposed surface, some NO_x (species) were detected by XPS. From the HREELS analysis, the hydrogen adsorbed on the H-Di(111) is not fully removed by exposure to the different nitrogen plasmas. These measurements show that NH(ads) species are formed on the surface and are desorbed upon vacuum annealing in the 500–700 °C range. This study may be of importance in all ex-situ applications influenced by the near-surface physicochemical and electronic properties of nitrogen-terminated H-Di(111) surfaces.

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利用 XPS 和 HREELS 研究氮、氧和氢键以及环境暴露氮端 H-金刚石 (111) 表面的热稳定性

我们报告了氮等离子体终止 H-Diamond(111)（H-Di(111)）表面的化学成分、键合和真空热稳定性（高达 1000 °C），然后进行环境暴露。氮等离子体暴露包括射频（RF）（压力：3 × 10-2（破坏性）和 7 × 10-2 托（非破坏性））和微波（MW）氮等离子体，并通过 X 射线光电子能谱（XPS）和高分辨率电子能量损失能谱（HREELS）进行研究。在暴露于射频（N2）破坏性等离子体时观察到最大的氮摄入量，其次是微波（N2）和非破坏性射频（N2）等离子体。在吸附不定氧时也有类似的趋势。XPS 分析表明，氮化物表面暴露在环境条件下时，大部分不定氧以 COx 构型被吸附。然而，在破坏性射频（N2）等离子体暴露表面进行高温退火后，XPS 检测到了一些氮氧化物（物种）。从 HREELS 分析来看，H-Di(111) 上吸附的氢并没有因为暴露在不同的氮等离子体中而完全去除。这些测量结果表明，NH（吸附）物种在表面形成，并在 500-700 °C 真空退火后解吸。这项研究可能对所有受氮封端 H-Di(111)表面近表面物理化学和电子特性影响的原位应用具有重要意义。

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来源期刊

Surface Science 化学-物理：凝聚态物理

CiteScore

3.30

自引率

5.30%

发文量

137

审稿时长

25 days

期刊介绍： Surface Science is devoted to elucidating the fundamental aspects of chemistry and physics occurring at a wide range of surfaces and interfaces and to disseminating this knowledge fast. The journal welcomes a broad spectrum of topics, including but not limited to: • model systems (e.g. in Ultra High Vacuum) under well-controlled reactive conditions • nanoscale science and engineering, including manipulation of matter at the atomic/molecular scale and assembly phenomena • reactivity of surfaces as related to various applied areas including heterogeneous catalysis, chemistry at electrified interfaces, and semiconductors functionalization • phenomena at interfaces relevant to energy storage and conversion, and fuels production and utilization • surface reactivity for environmental protection and pollution remediation • interactions at surfaces of soft matter, including polymers and biomaterials. Both experimental and theoretical work, including modeling, is within the scope of the journal. Work published in Surface Science reaches a wide readership, from chemistry and physics to biology and materials science and engineering, providing an excellent forum for cross-fertilization of ideas and broad dissemination of scientific discoveries.