Enhancement of anti-oxidation and tensile strength of nanotwinned Cu foils by preferential Ni electrodeposition

IF 5.5 3区 材料科学 Q1 ELECTROCHEMISTRY
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Abstract

In this study, Ni was employed to enhance the mechanical properties of nanotwinned copper (NT-Cu) foils due to its excellent oxidation resistance and compatibility with Cu. The tensile strength of the NT-Cu foils was enhanced 12.6 % (752.8 to 847.3 MPa) by Ni co-electrodeposition. During the electroplating, it was found that Ni ions inhibited the Cu growth, causing the reduction potential (overpotential) to shift in the negative direction. It resulted in a reduced deposition rate and decreased the twin spacing of the foils. Additionally, Ni ions acted as impurities for the grain refinement. Time of flight secondary ion mass spectrometry (TOF-SIMS) results indicated that Ni atoms were deposited on the top and bottom of the foils due to the limiting current density of Ni. The NT-Cu-Ni exhibited low roughness and performed superior resistance to oxidation compared to the NT-Cu. X-ray photoelectron spectroscopy (XPS) was also utilized to characterize the oxidation of the Cu (Ni) alloys. These mechanisms contributed to high strength, low resistivity, and excellent oxidation resistance of the NT-Cu-Ni foils for future battery materials.

通过优先镍电沉积提高纳米缠绕铜箔的抗氧化性和拉伸强度
在这项研究中,由于镍具有优异的抗氧化性和与铜的相容性,因此采用镍来提高纳米铜箔(NT-Cu)的机械性能。通过镍共电镀,纳米铜箔的拉伸强度提高了 12.6%(752.8 至 847.3 兆帕)。在电镀过程中,发现镍离子抑制了铜的生长,导致还原电位(过电位)向负方向移动。这导致沉积速率降低,箔的孪生间距减小。此外,镍离子还是晶粒细化的杂质。飞行时间二次离子质谱(TOF-SIMS)结果表明,由于镍的极限电流密度,镍原子沉积在箔的顶部和底部。与 NT-Cu 相比,NT-Cu-Ni 的粗糙度较低,抗氧化能力更强。此外,还利用 X 射线光电子能谱 (XPS) 分析了铜(镍)合金的氧化特性。这些机理使 NT-Cu-Ni 箔具有高强度、低电阻率和出色的抗氧化性,可用于未来的电池材料。
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来源期刊
Electrochimica Acta
Electrochimica Acta 工程技术-电化学
CiteScore
11.30
自引率
6.10%
发文量
1634
审稿时长
41 days
期刊介绍: Electrochimica Acta is an international journal. It is intended for the publication of both original work and reviews in the field of electrochemistry. Electrochemistry should be interpreted to mean any of the research fields covered by the Divisions of the International Society of Electrochemistry listed below, as well as emerging scientific domains covered by ISE New Topics Committee.
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