Abnormal photoluminescence properties of InAs/InAsSb in-plane ultrahigh-density quantum dots

Sim Jui Oon, Takumi Ohyama, Naoya Miyashita, Koichi Yamaguchi
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Abstract

InAs/InAsSb ultrahigh-density quantum dots (UHD QDs) with a density of 1×1012 cm-2 were fabricated using molecular beam epitaxy, and their photoluminescence (PL) properties were characterized. Through temperature dependences of PL energy, intensity and decay time of UHD QDs, it was found that in-plane strong coupling between adjacent QDs of excited and ground states due to homogeneous broadening of QD levels progressed above 60 K and above 100 K, respectively. The findings regarding the strong coupling at ground states were consistent with the temperature dependence of PL minimum energy outlined in Appendix. In addition, abnormal phenomenon in PL full width at half maximum (FWHM) was attributed to the in-plane miniband formation resulting from strong coupling.
InAs/InAsSb 面内超高密度量子点的异常光致发光特性
利用分子束外延技术制备了密度为 1×1012 cm-2 的 InAs/InAsSb 超高密度量子点(UHD QDs),并对其光致发光(PL)特性进行了表征。通过对 UHD QDs 的光致发光能量、强度和衰减时间的温度依赖性研究发现,相邻 QDs 之间的激发态和基态的面内强耦合分别发生在 60 K 和 100 K 以上。有关基态强耦合的发现与附录中概述的聚光最小能量的温度依赖性一致。此外,PL 半最大值全宽(FWHM)的异常现象归因于强耦合导致的面内迷你带的形成。
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