A novel method to solve analytically the non-linear Poisson equation in the inversion layer of a MOSFET

Pedro Pereyra
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Abstract

Despite the enormous importance that the metal oxide semiconductors (MOS) and the field effect transistors (MOSFETs) have in the actual semiconductor technology, the task of finding the analytical solution of the Poisson equation in the inversion layer was not fully accomplished for more than half a century. It is a well-known fact that due to the non-linear nature of this equation, the attempts to solve it got stuck after the first integration. Nevertheless, experimental and applied researchers found ways to characterize, control, and develop MOSFET devices based on approximate models, and numerical calculations. Here I present a new method to analytically solve the nonlinear Poisson equation, in principle, for any charge distribution in the inversion layer of a MOS, and for the charge density of the original Shockley model, in particular. To this purpose, a physical argument related to the charge and field energies in the transient population-inversion process is introduced and a new nonlinear {\it but solvable} second order differential equation is obtained, whose solution also solves the original Poisson equation. The analytical results presented here allow us to derive explicit expressions for the electrical potential distribution and, very importantly, for the charge distribution, the inversion layer width and the effective impurity concentration in the depletion layer. The quantum Hall effect and other physical phenomena were discovered in the inversion layer of a MOS. The Hall effect was explained under the assumption that the charge distribution is a two-dimensional electron gas, we show here however that the 2D limit is reached only at high gate voltages. When applied to MOSFET structures, we obtain new expressions for the drain currents in the inversion and depletion layers, as functions of the impurity concentration and the gate voltage. This method can be used directly, as a building block, for multi-gate MOSFETs.
分析解决 MOSFET 反相层非线性泊松方程的新方法
尽管金属氧化物半导体(MOS)和场效应晶体管(MOSFET)在实际半导体技术中具有巨大的重要性,但半个多世纪以来,寻找反转层中泊松方程的解析解的任务一直未能完全完成。众所周知,由于该方程的非线性性质,求解该方程的尝试在第一次积分后就陷入了困境。尽管如此,实验和应用研究人员还是根据近似模型和数值计算找到了表征、控制和开发 MOSFET 器件的方法。在此,我提出了一种新方法,用于分析求解非线性泊松方程,原则上适用于 MOS 反转层中的任何电荷分布,特别是原始肖克利模型的电荷密度。为此,我们引入了与瞬态种群反转过程中电荷和场能有关的物理论据,并得到了一个新的非线性{(it)但可解}二阶微分方程,其解法也能求解原始泊松方程。这里给出的分析结果使我们能够推导出电势分布的明确表达式,以及非常重要的电荷分布、反转层宽度和耗尽层中有效杂质浓度的明确表达式。在 MOS 的反转层中发现了量子霍尔效应和其他物理现象。霍尔效应是在电荷分布为二维电子气的假设下解释的,但我们在此表明,只有在高栅极电压下才能达到二维极限。当应用于 MOSFET 结构时,我们得到了反相层和耗尽层中漏极电流的新表达式,它是杂质浓度和栅极电压的函数。这种方法可以作为一个构件直接用于多栅极 MOSFET。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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