M. S. Lukasov, N. A. Arkharova, A. S. Orekhov, T. S. Kamilov, V. V. Klechkovskaya
{"title":"Selecting a Target for Obtaining Films of Higher Manganese Silicide Using Magnetron Sputtering","authors":"M. S. Lukasov, N. A. Arkharova, A. S. Orekhov, T. S. Kamilov, V. V. Klechkovskaya","doi":"10.1134/S106377452460042X","DOIUrl":null,"url":null,"abstract":"<p>Thin manganese silicide films were obtained on mica by magnetron sputtering from targets of three types. The microstructure and elemental composition of the targets and films were studied by scanning electron microscopy and reflection electron diffraction. The phase composition and structure of the films over depth (cuts) were controlled by scanning and transmission electron microscopy. It has been shown that, when depositing films from poly- and single-crystal targets of higher manganese silicide, in contrast to a target from sintered Мn and Si powders, one can obtain polycrystalline films of higher manganese silicide of the Mn<sub>4</sub>Si<sub>7</sub> composition after subsequent 1-h annealing at a temperature of 800 K and a pressure of 10<sup>–3</sup> Pa.</p>","PeriodicalId":527,"journal":{"name":"Crystallography Reports","volume":"69 3","pages":"374 - 379"},"PeriodicalIF":0.6000,"publicationDate":"2024-07-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Crystallography Reports","FirstCategoryId":"88","ListUrlMain":"https://link.springer.com/article/10.1134/S106377452460042X","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"CRYSTALLOGRAPHY","Score":null,"Total":0}
引用次数: 0
Abstract
Thin manganese silicide films were obtained on mica by magnetron sputtering from targets of three types. The microstructure and elemental composition of the targets and films were studied by scanning electron microscopy and reflection electron diffraction. The phase composition and structure of the films over depth (cuts) were controlled by scanning and transmission electron microscopy. It has been shown that, when depositing films from poly- and single-crystal targets of higher manganese silicide, in contrast to a target from sintered Мn and Si powders, one can obtain polycrystalline films of higher manganese silicide of the Mn4Si7 composition after subsequent 1-h annealing at a temperature of 800 K and a pressure of 10–3 Pa.
期刊介绍：
Crystallography Reports is a journal that publishes original articles short communications, and reviews on various aspects of crystallography: diffraction and scattering of X-rays, electrons, and neutrons, determination of crystal structure of inorganic and organic substances, including proteins and other biological substances; UV-VIS and IR spectroscopy; growth, imperfect structure and physical properties of crystals; thin films, liquid crystals, nanomaterials, partially disordered systems, and the methods of studies.
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
